100 kV thermal field emission electron beam lithography tool for high-resolution x-ray mask patterning

1992 ◽  
Vol 10 (6) ◽  
pp. 2764 ◽  
Author(s):  
M. A. McCord
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Field Emission ◽  
Electron Beam Lithography ◽  
Thermal Field ◽  
X Ray ◽  
Emission Electron

Evaluation of a 100 kV thermal field emission electron-beam nanolithography system

2000 ◽  
Vol 18 (6) ◽  
pp. 3089 ◽  
Author(s):  
D. M. Tennant ◽  
R. Fullowan ◽  
H. Takemura ◽  
M. Isobe ◽  
Y. Nakagawa
Keyword(s):  
Electron Beam ◽  
Field Emission ◽  
Thermal Field ◽  
Emission Electron

High resolution x-ray mask fabrication by a 100 keV electron-beam lithography system

2004 ◽  
Vol 14 (5) ◽  
pp. 722-726 ◽  
Author(s):  
Lin Wang ◽  
Yohannes M Desta ◽  
Rainer K Fettig ◽  
Jost Goettert ◽  
Herbert Hein ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Electron Beam Lithography ◽  
X Ray ◽  
Lithography System ◽  
Mask Fabrication

Low-voltage microscopy and position-tagged spectrometry of ceramic microstructures

1996 ◽  
Vol 54 ◽  
pp. 682-683
Author(s):  
J. J Friel ◽  
V. A. Greenhut
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Field Emission ◽  
Low Voltage ◽  
Beam Current ◽  
X Ray ◽  
Interaction Volume ◽  
Detector Geometry ◽  
Field Emission Microscopy ◽  
Emission Microscopy

Ceramic microstructures are ideally suited for low-voltage field emission microscopy on uncoated samples. Most elements of interest in ceramics have useful X-ray lines below 5 keV, thus permitting the use of accelerating voltages between 3 and 8 kV. One analytical consequence of the use of low voltage is a reduced interaction volume with the electron beam, so that X-ray maps can be collected at submicrometer resolution. To produce usable maps at low voltage, the SEM must be capable of sufficient beam current, and the X-ray detector geometry must be optimal. Another way to optimize X-ray microanalysis is to collect an entire spectrum at every point in the microstructure even at high resolution. Although this capability would permit an X-ray spectrum to be displayed from one pixel, a much more productive approach is to create a spectrum based on all pixels of a particular phase.

High resolution spin-on electron beam lithography resist with exceptional dry etching resistance

2015 ◽  
Vol 1 (1) ◽  
pp. 13-19 ◽  
Author(s):  
G. Grenci ◽  
E. Zanchetta ◽  
A. Pozzato ◽  
G. Della Giustina ◽  
G. Brusatin ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Electron Beam Lithography ◽  
Dry Etching
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