High-rate ion etching of GaAs and Si at low ion energy by using an electron beam excited plasma system

1988 ◽  
Vol 6 (6) ◽  
pp. 1626 ◽  
Author(s):  
Jin-Zhong Yu
Keyword(s):  
Electron Beam ◽  
High Rate ◽  
Plasma System ◽  
Ion Etching ◽  
Ion Energy

Hard Carbon Films with Various Microstructure Prepared by Ion Assisted Evaporation

1993 ◽  
Vol 316 ◽  
Author(s):  
J. Ullmann ◽  
A. Weber ◽  
U. Falke
Keyword(s):  
Growth Mechanism ◽  
Film Growth ◽  
Carbon Films ◽  
Carbon Surface ◽  
Vickers Indentation ◽  
Structure Modification ◽  
Hard Carbon ◽  
Ion Etching ◽  
Ion Energy ◽  
Free Ion

ABSTRACTFor a deeper understanding of the creation of carbon films the hydrogen-free ion assisted evaporation (IAE) method with neon species was used. Variation of the ion parameters energy and ion to neutral arrival ratio, delivering the necessary energy for modification of the film growth, results in different microstructures investigated with EELS, HRTEM and TED as well as different microhardnesses measured by dynamical Vickers indentation. A possible film growth mechanism is proposed based on an ion etching of mainly sp2-bonded carbon surface atoms and on defect dominated structure modification below the surface depending on the ion energy

A High-Rate Two-Dimensional Polyarylimide Covalent Organic Framework Anode for Aqueous Zn-Ion Energy Storage Devices

2020 ◽  
Vol 142 (46) ◽  
pp. 19570-19578
Author(s):  
Minghao Yu ◽  
Naisa Chandrasekhar ◽  
Ramya Kormath Madam Raghupathy ◽  
Khoa Hoang Ly ◽  
Haozhe Zhang ◽  
...  
Keyword(s):  
Energy Storage ◽  
High Rate ◽  
Two Dimensional ◽  
Energy Storage Devices ◽  
Ion Energy ◽  
Storage Devices ◽  
Covalent Organic Framework ◽  
Organic Framework

Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films

2021 ◽  
Vol 39 (3) ◽  
pp. 033002
Author(s):  
S. G. Walton ◽  
D. R. Boris ◽  
S. G. Rosenberg ◽  
H. Miyazoe ◽  
E. A. Joseph ◽  
...  
Keyword(s):  
Electron Beam ◽  
Ion Energy ◽  
Silicon Based

Accessibility of equilibria in an electron beam plasma system. II

1977 ◽  
Vol 20 (12) ◽  
pp. 2088
Author(s):  
Alexander Cavalli ◽  
John B. Greenly ◽  
J. E. Walsh
Keyword(s):  
Electron Beam ◽  
Plasma System ◽  
Beam Plasma ◽  
Electron Beam Plasma
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