Thickness distribution of large-area diamondlike carbon films formed by CH4/H2 supermagnetron plasma chemical vapor deposition with application of a stationary magnetic field

2000 ◽  
Vol 18 (2) ◽  
pp. 367-371 ◽  
Author(s):  
Haruhisa Kinoshita ◽  
Shyuji Nomura ◽  
Masahiro Honda
Keyword(s):  
Magnetic Field ◽  
Vapor Deposition ◽  
Thickness Distribution ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Stationary Magnetic Field ◽  
Large Area ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Diamondlike Carbon

404 The high-speed and large-area synthesis of diamond using in-liquid plasma chemical vapor deposition

2009 ◽  
Vol 2009.47 (0) ◽  
pp. 101-102
Author(s):  
Yohei Ishimaru ◽  
Shinfuku Nomura ◽  
Hiromichi Toyota ◽  
Yoshiyuki Takahashi ◽  
Shinobu Mukasa
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Speed ◽  
Chemical Vapor ◽  
Large Area ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition

Photoelectron Emission Study of Hydrogenated Amorphous Carbon Films Prepared by RF Plasma Chemical Vapor Deposition

1991 ◽  
Vol 30 (Part 2, No. 5B) ◽  
pp. L924-L926 ◽  
Author(s):  
Masatoshi Nakayama ◽  
Kunihiro Ueda ◽  
Masanori Shibahara ◽  
Kazunori Maruyama ◽  
Kiichiro Kamata
Keyword(s):  
Vapor Deposition ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Rf Plasma ◽  
Photoelectron Emission ◽  
Plasma Chemical ◽  
Amorphous Carbon Films ◽  
Plasma Chemical Vapor Deposition ◽  
Emission Study ◽  
Hydrogenated Amorphous
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