Effects of moisture on Fowler–Nordheim characterization of thin silicon-oxide films

1999 ◽  
Vol 17 (5) ◽  
pp. 2753-2758 ◽  
Author(s):  
Charles A. Peterson ◽  
Richard K. Workman ◽  
Dror Sarid ◽  
Bert Vermeire ◽  
Harold G. Parks ◽  
...  
Keyword(s):  
Silicon Oxide ◽  
Oxide Films ◽  
Thin Silicon

Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions

Vacuum ◽  
2004 ◽  
Vol 75 (4) ◽  
pp. 307-312 ◽  
Author(s):  
F Hamelmann ◽  
A Aschentrup ◽  
A Brechling ◽  
U Heinzmann ◽  
A Gushterov ◽  
...  
Keyword(s):  
Silicon Oxide ◽  
Oxide Films ◽  
Thin Silicon

X-ray photoelectron spectroscopic characterization of ultra-thin silicon oxide films on a Mo(100) surface

1992 ◽  
Vol 279 (1-2) ◽  
pp. 119-126 ◽  
Author(s):  
J-W. He ◽  
X. Xu ◽  
J.S. Corneille ◽  
D.W. Goodman
Keyword(s):  
Silicon Oxide ◽  
Oxide Films ◽  
Spectroscopic Characterization ◽  
X Ray ◽  
Thin Silicon

Surface characterization of thin silicon-rich oxide films

2011 ◽  
Vol 993 (1-3) ◽  
pp. 214-218 ◽  
Author(s):  
D. Ristić ◽  
V. Holý ◽  
M. Ivanda ◽  
M. Marciuš ◽  
M. Buljan ◽  
...  
Keyword(s):  
Surface Characterization ◽  
Oxide Films ◽  
Thin Silicon

Low‐level leakage currents in thin silicon oxide films

1994 ◽  
Vol 76 (1) ◽  
pp. 319-327 ◽  
Author(s):  
D. J. Dumin ◽  
J. R. Cooper ◽  
J. R. Maddux ◽  
R. S. Scott ◽  
D.‐P. Wong
Keyword(s):  
Silicon Oxide ◽  
Oxide Films ◽  
Leakage Currents ◽  
Low Level ◽  
Thin Silicon

Growth Rate and Characterization of Silicon Oxide Films Grown in  N 2 O  Atmosphere in a Rapid Thermal Processor

1994 ◽  
Vol 141 (1) ◽  
pp. 259-263 ◽  
Author(s):  
P. Lange ◽  
H. Bernt ◽  
E. Hartmannsgruber ◽  
F. Naumann
Keyword(s):  
Growth Rate ◽  
Silicon Oxide ◽  
Oxide Films

Plasma-assisted chemical vapor deposition and characterization of high quality silicon oxide films

1990 ◽  
Vol 193-194 ◽  
pp. 595-609 ◽  
Author(s):  
S.V Nguyen ◽  
D Dobuzinsky ◽  
D Dopp ◽  
R Gleason ◽  
M Gibson ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Chemical Vapor ◽  
High Quality

scholarly journals Introducing pinhole magnification by selective etching: application to poly-Si on ultra-thin silicon oxide films

2017 ◽  
Vol 124 ◽  
pp. 435-440 ◽  
Author(s):  
Dominic Tetzlaff ◽  
Marvin Dzinnik ◽  
Jan Krügener ◽  
Yevgeniya Larionova ◽  
Sina Reiter ◽  
...  
Keyword(s):  
Silicon Oxide ◽  
Oxide Films ◽  
Selective Etching ◽  
Thin Silicon
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