Comparison of Cl2 and F2 based chemistries for the inductively coupled plasma etching of NiMnSb thin films

1999 ◽  
Vol 17 (4) ◽  
pp. 1326-1330 ◽  
Author(s):  
J. Hong ◽  
J. A. Caballero ◽  
E. S. Lambers ◽  
J. R. Childress ◽  
S. J. Pearton
Keyword(s):  
Thin Films ◽  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Inductively coupled plasma etching of BZN thin films in SF6/Ar plasmas

2013 ◽  
Author(s):  
Gang Wang ◽  
Ping Li ◽  
Guojun Zhang ◽  
Wei Li ◽  
Liping Dai ◽  
...  
Keyword(s):  
Thin Films ◽  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Inductively coupled plasma etching for delineation of InAs/GaSb pixels

2012 ◽  
Author(s):  
Jean Nguyen ◽  
John Gill ◽  
Sir B. Rafol ◽  
Alexander Soibel ◽  
Arezou Khoshakhlagh ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Inductively coupled plasma etching of HgCdTe using a CH4-based mixture

2005 ◽  
Vol 34 (6) ◽  
pp. 740-745 ◽  
Author(s):  
E. Laffosse ◽  
J. Baylet ◽  
J. P. Chamonal ◽  
G. Destefanis ◽  
G. Cartry ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled
Sign in / Sign up

Export Citation Format

Share Document