Platinum etching in Ar/O2 mixed gas plasma with a thin SiO2 etching mask

1998 ◽  
Vol 16 (2) ◽  
pp. 502-508 ◽  
Author(s):  
Teruo Shibano ◽  
Keisuke Nakamura ◽  
Tatsuo Oomori
2019 ◽  
Vol 34 (5) ◽  
pp. 891-898 ◽  
Author(s):  
Guilherme Luiz Scheffler ◽  
Dirce Pozebon ◽  
Diane Beauchemin

Adding nitrogen to the plasma gas in ICPOES significantly improves sensitivity and limit of detection for solid sampling ETV.


2017 ◽  
Vol 32 (9) ◽  
pp. 1688-1696 ◽  
Author(s):  
Yoseif Makonnen ◽  
William R. MacFarlane ◽  
Majdi L. Geagea ◽  
Diane Beauchemin

A robust Ar–N2–H2plasma enables accurate multielemental analysis of geological and environmental samples without matrix-matching or internal standardization.


2013 ◽  
Vol 116 ◽  
pp. 231-237 ◽  
Author(s):  
Li Wang ◽  
Xiaodan Zhang ◽  
Xu Yang ◽  
Changchun Wei ◽  
Xinliang Chen ◽  
...  

2013 ◽  
Vol 7 (7) ◽  
pp. 1415-1423 ◽  
Author(s):  
Guilherme Luiz Scheffler ◽  
Valderi Luiz Dressler ◽  
Dirce Pozebon
Keyword(s):  
Icp Oes ◽  

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