Investigations of the surface chemistry of silicon substrates etched in a rf-biased inductively coupled fluorocarbon plasma using Fourier-transform infrared ellipsometry
1998 ◽
Vol 16
(1)
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pp. 225-232
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1998 ◽
Vol 37
(Part 1, No. 8)
◽
pp. 4522-4526
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Keyword(s):
2016 ◽
Vol 698
◽
pp. 13-18
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Keyword(s):