Molecular beam epitaxy of p-type ZnSSe using a nitric oxide plasma source

1997 ◽  
Vol 15 (4) ◽  
pp. 2426-2427
Author(s):  
P. Uusimaa ◽  
K. Rakennus ◽  
A. Salokatve ◽  
M. Pessa ◽  
J. Likonen
Keyword(s):  
Nitric Oxide ◽  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Plasma Source ◽  
P Type

p‐type CdSe grown by molecular beam epitaxy using a nitrogen plasma source

1994 ◽  
Vol 65 (4) ◽  
pp. 466-468 ◽  
Author(s):  
Takeo Ohtsuka ◽  
Junji Kawamata ◽  
Ziqiang Zhu ◽  
Takafumi Yao
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Plasma Source ◽  
Nitrogen Plasma ◽  
P Type

Low Resistance Ohmic Contact on p-type GaN Grown by Plasma-Assisted Molecular Beam Epitaxy

1996 ◽  
Vol 423 ◽  
Author(s):  
Myung C. Yoo ◽  
J. W. Lee ◽  
J. M. Myoung ◽  
K. H. Shim ◽  
K. Kim
Keyword(s):  
Molecular Beam Epitaxy ◽  
Ohmic Contacts ◽  
Doping Concentration ◽  
Molecular Beam ◽  
Plasma Source ◽  
Nitrogen Plasma ◽  
Specific Contact Resistance ◽  
Metal Bilayers ◽  
Auger Microscopy ◽  
P Type

AbstractOhmic contacts on p-type GaN have been investigated. High quality GaN epilayers on cplane sapphire were prepared using plasma-assisted molecular beam epitaxy that utilized an inductively coupled rf nitrogen plasma source and solid source beams. The resulting film thickness and the doping concentration of the grown samples were in the range of 0.7–1.35 μm and 1018 – 1020/cm3, respectively. The metallization consisted of high work function metal bilayers which included a combinations of 25 nm-thick Ni, Ti, Pt and/or Cr and 200 nm-thick Au on the highly p-doped GaN in a transmission line model pattern. Ohmic contacts were formed by alloying the bi-layers using rapid thermal annealing (RTA) at temperatures in the range of 300–700 °C for 1 min under nitrogen ambient. Current-voltage measurements showed that the specific contact resistance was as low as 1.2 × 10 −4 Ω–cm2 for the sample having 1.4 × 1020/cm3p-type doping concentration with a Cr/Au contact annealed at 500 °C for 1 min by RTA. Judging from the scanning Auger microscopy results and the glancing angle x-ray diffraction analysis, this resistance is attributed to Cr diffusion into the GaN layer.

Molecular beam epitaxy of p-type ZnSTe:N and p-n-junction light emitting diodes

2014 ◽  
Vol 11 (7-8) ◽  
pp. 1282-1285 ◽  
Author(s):  
Kunio Ichino ◽  
Takahiro Kojima ◽  
Shunsuke Obata ◽  
Takuma Kuroyanagi ◽  
Kenta Kimata ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Light Emitting Diodes ◽  
Light Emitting ◽  
P Type

scholarly journals Comparison of deep level spectra in p-type and n-type GaN grown by molecular beam epitaxy [phys. stat. sol. (b) 244, No. 6, 1867–1871 (2007)]

2007 ◽  
Vol 244 (12) ◽  
pp. 4692-4692
Author(s):  
A. Armstrong ◽  
A. Corrion ◽  
C. Poblenz ◽  
U. K. Mishra ◽  
J. S. Speck ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Deep Level ◽  
P Type

p‐type doping of gallium antimonide grown by molecular beam epitaxy using silicon

1990 ◽  
Vol 57 (21) ◽  
pp. 2256-2258 ◽  
Author(s):  
T. M. Rossi ◽  
D. A. Collins ◽  
D. H. Chow ◽  
T. C. McGill
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Gallium Antimonide ◽  
P Type

Heavily carbon-doped p-type (In)GaAs grown by gas-source molecular beam epitaxy using diiodomethane

1995 ◽  
Vol 150 ◽  
pp. 221-226
Author(s):  
T. Tomioka ◽  
N. Okamoto ◽  
H. Ando ◽  
S. Yamaura ◽  
T. Fujii
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Carbon Doped ◽  
Gas Source ◽  
P Type

High Gain and High Sensitive Blue-Ultraviolet Avalanche Photodiodes (APDs) of ZnSSe n+-i-p Structure Molecular Beam Epitaxy (MBE) Grown on p-type GaAs Substrates

2005 ◽  
Vol 44 (No. 17) ◽  
pp. L508-L510 ◽  
Author(s):  
Tomoki Abe ◽  
Koshi Ando ◽  
Katsushi Ikumi ◽  
Hiroyasu Maeta ◽  
Junji Naruse ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Avalanche Photodiodes ◽  
High Gain ◽  
Gaas Substrates ◽  
P Type

p-type conductivity control of ZnSe with insertion of ZnTe:Li submonolayers in metalorganic molecular-beam epitaxy

1998 ◽  
Vol 84 (11) ◽  
pp. 6100-6104 ◽  
Author(s):  
J. Hirose ◽  
K. Uesugi ◽  
M. Hoshiyama ◽  
T. Numai ◽  
I. Suemune ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Type Conductivity ◽  
Metalorganic Molecular Beam Epitaxy ◽  
P Type
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