Ion beam induced chemical vapor deposition procedure for the preparation of oxide thin films. II. Preparation and characterization of AlxTiyOz thin films

D. Leinen; G. Lassaletta; A. Fernández; A. Caballero; A. R. González‐Elipe; J. M. Martín; B. Vacher

doi:10.1116/1.580233

Ion beam induced chemical vapor deposition procedure for the preparation of oxide thin films. II. Preparation and characterization of AlxTiyOz thin films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580233 ◽

1996 ◽

Vol 14 (5) ◽

pp. 2842-2848 ◽

Cited By ~ 31

Author(s):

D. Leinen ◽

G. Lassaletta ◽

A. Fernández ◽

A. Caballero ◽

A. R. González‐Elipe ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Ion Beam ◽

Chemical Vapor ◽

Oxide Thin Films

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Ion beam induced chemical vapor deposition procedure for the preparation of oxide thin films. I. Preparation and characterization of TiO2 thin films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579096 ◽

1994 ◽

Vol 12 (5) ◽

pp. 2728-2732 ◽

Cited By ~ 31

Author(s):

D. Leinen ◽

J. P. Espinós ◽

A. Fernández ◽

A. R. González‐Elipe

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Ion Beam ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Tio2 Thin Films

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Electrical characteristics of mixed Zr–Si oxide thin films prepared by ion beam induced chemical vapor deposition at room temperature

Thin Solid Films ◽

10.1016/j.tsf.2009.01.099 ◽

2009 ◽

Vol 517 (18) ◽

pp. 5446-5452 ◽

Cited By ~ 3

Author(s):

F.J. Ferrer ◽

F. Frutos ◽

J. García-López ◽

C. Jiménez ◽

F. Yubero

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Ion Beam ◽

Chemical Vapor ◽

Electrical Characteristics ◽

Oxide Thin Films

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Iron oxide thin films prepared by ion beam induced chemical vapor deposition: Structural characterization by infrared spectroscopy

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1286198 ◽

2000 ◽

Vol 18 (5) ◽

pp. 2244 ◽

Cited By ~ 16

Author(s):

F. Yubero ◽

M. Ocaña ◽

A. Justo ◽

L. Contreras ◽

A. R. González-Elipe

Keyword(s):

Thin Films ◽

Infrared Spectroscopy ◽

Chemical Vapor Deposition ◽

Iron Oxide ◽

Structural Characterization ◽

Vapor Deposition ◽

Ion Beam ◽

Chemical Vapor ◽

Oxide Thin Films

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Characterization of Hafnium Oxide Thin Films by Source Gas Pulse Introduced Metalorganic Chemical Vapor Deposition Using Amino-Family Hf Precursors

Japanese Journal of Applied Physics ◽

10.1143/jjap.42.6015 ◽

2003 ◽

Vol 42 (Part 1, No. 9B) ◽

pp. 6015-6018 ◽

Cited By ~ 12

Author(s):

Shiro Hino ◽

Makoto Nakayama ◽

Kenji Takahashi ◽

Hiroshi Funakubo ◽

Eisuke Tokumitsu

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Hafnium Oxide ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Metalorganic Chemical

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Characterization of Lead Oxide Thin Films Produced by Chemical Vapor Deposition

Journal of the American Ceramic Society ◽

10.1111/j.1151-2916.1998.tb02436.x ◽

2005 ◽

Vol 81 (4) ◽

pp. 988-996 ◽

Cited By ~ 12

Author(s):

Lynnette D. Madsen ◽

Louise Weaver

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Lead Oxide ◽

Chemical Vapor ◽

Oxide Thin Films

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Plasma and gas-phase characterization of a pulsed plasma-enhanced chemical vapor deposition system engineered for self-limiting growth of aluminum oxide thin films

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2007.04.076 ◽

2007 ◽

Vol 201 (22-23) ◽

pp. 8991-8997 ◽

Cited By ~ 28

Author(s):

Scott F. Szymanski ◽

Michael T. Seman ◽

Colin A. Wolden

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Gas Phase ◽

Vapor Deposition ◽

Chemical Vapor ◽

Pulsed Plasma ◽

Oxide Thin Films ◽

Phase Characterization

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Tin Oxide Thin Films Prepared by Ion Beam Induced Chemical Vapor Deposition

Shinku ◽

10.3131/jvsj.49.780 ◽

2006 ◽

Vol 49 (12) ◽

pp. 780-781

Author(s):

Yuka FUJIKAWA ◽

Masato KIUCHI ◽

Takaomi MATSUTANI ◽

Takae TAKEUCHI

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Tin Oxide ◽

Vapor Deposition ◽

Ion Beam ◽

Chemical Vapor ◽

Oxide Thin Films

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Characterization of Tin(IV) Oxide Thin Films Prepared by Atmospheric Pressure Chemical Vapor Deposition ofcis-[SnCl4{OC(H)OC2H5}2]

Zeitschrift für anorganische und allgemeine Chemie ◽

10.1002/zaac.200800394 ◽

2009 ◽

Vol 635 (1) ◽

pp. 53-63 ◽

Cited By ~ 12

Author(s):

Nari N. Talaty ◽

Kristina Beck ◽

Helene Citeau ◽

Kristin Kirschbaum ◽

Dean M. Giolando

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Pressure Chemical

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The Quality Improvement of Yttrium Oxide Thin Films Grown at Low Temperature via the 3 rd Generation Mist Chemical Vapor Deposition Using Oxygen Supporting Sources

physica status solidi (b) ◽

10.1002/pssb.202100105 ◽

2021 ◽

Author(s):

Li Liu ◽

Toshiyuki Kawaharamura ◽

Masahito Sakamoto ◽

Misaki Nishi ◽

Giang T. Dang ◽

...

Keyword(s):

Thin Films ◽

Quality Improvement ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Yttrium Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films

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Electrical conduction in 10–20 nm thick polycrystalline tin oxide thin films deposited by chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2008.11.047 ◽

2009 ◽

Vol 517 (9) ◽

pp. 2953-2958 ◽

Cited By ~ 6

Author(s):

Yuji Matsui ◽

Yuichi Yamamoto

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Tin Oxide ◽

Electrical Conduction ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

20 Nm

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