Growth behavior of copper metalorganic chemical vapor deposition using the (hfac)Cu(VTMOS) precursor on titanium nitride substrates

Chi‐Hoon Jun; Youn Tae Kim; Jong‐Tae Baek; Hyung Joun Yoo; Dai‐Ryong Kim

doi:10.1116/1.580215

Growth behavior of copper metalorganic chemical vapor deposition using the (hfac)Cu(VTMOS) precursor on titanium nitride substrates

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580215 ◽

1996 ◽

Vol 14 (6) ◽

pp. 3214-3219 ◽

Cited By ~ 15

Author(s):

Chi‐Hoon Jun ◽

Youn Tae Kim ◽

Jong‐Tae Baek ◽

Hyung Joun Yoo ◽

Dai‐Ryong Kim

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Nitride ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Growth Behavior ◽

Metalorganic Chemical

Download Full-text

Growth behavior on V-grooved high Miller index GaAs substrates by metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(94)00527-3 ◽

1995 ◽

Vol 146 (1-4) ◽

pp. 482-488 ◽

Cited By ~ 8

Author(s):

Moo-Sung Kim ◽

Yong Kim ◽

Min-Suk Lee ◽

Young Ju Park ◽

Seong-II Kim ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Growth Behavior ◽

Miller Index ◽

Gaas Substrates ◽

Metalorganic Chemical

Download Full-text

Growth behavior of high k LaAlO 3 films on Si by metalorganic chemical vapor deposition for alternative gate dielectric application

Applied Surface Science ◽

10.1016/j.apsusc.2004.12.037 ◽

2005 ◽

Vol 250 (1-4) ◽

pp. 14-20 ◽

Cited By ~ 12

Author(s):

Qi-Yue Shao ◽

Ai-Dong Li ◽

Jin-Bo Cheng ◽

Hui-Qin Ling ◽

Di Wu ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Gate Dielectric ◽

Chemical Vapor ◽

Growth Behavior ◽

High K ◽

Metalorganic Chemical

Download Full-text

Comparative studies on the growth behavior of ZnO nanorods by metalorganic chemical vapor deposition depending on the type of substrates

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2004.11.390 ◽

2005 ◽

Vol 276 (3-4) ◽

pp. 458-464 ◽

Cited By ~ 41

Author(s):

Dong Ju Lee ◽

Jae Young Park ◽

Young Su Yun ◽

Yong Sung Hong ◽

Jong Ha Moon ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Comparative Studies ◽

Metalorganic Chemical Vapor Deposition ◽

Zno Nanorods ◽

Chemical Vapor ◽

Growth Behavior ◽

Metalorganic Chemical

Download Full-text

Early stage growth behavior of ZnO nanoneedle arrays on Al2O3 (0001) by metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2005.04.035 ◽

2005 ◽

Vol 281 (2-4) ◽

pp. 446-451 ◽

Cited By ~ 11

Author(s):

Jae Young Park ◽

Jae Mok Lee ◽

Jung Ho Je ◽

Sang Sub Kim

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Early Stage ◽

Chemical Vapor ◽

Growth Behavior ◽

Metalorganic Chemical

Download Full-text

Enhancement of titanium nitride barrier metal properties by nitrogen radical assisted metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.116190 ◽

1996 ◽

Vol 68 (18) ◽

pp. 2580-2582 ◽

Cited By ~ 15

Author(s):

Y. H. Chang ◽

J. S. Chun ◽

J. E. Oh ◽

S. J. Won ◽

S. H. Paek ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Nitride ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Barrier Metal ◽

Metal Properties ◽

Nitrogen Radical ◽

Metalorganic Chemical

Download Full-text

Enhanced Metalorganic Chemical Vapor Deposition Titanium Nitride Film Fabricated Using Tetrakis-Dimethylamino-Titanium for Barrier Metal Application in Sub-Half-Micron Technology

Japanese Journal of Applied Physics ◽

10.1143/jjap.35.4274 ◽

1996 ◽

Vol 35 (Part 1, No. 8) ◽

pp. 4274-4279 ◽

Cited By ~ 5

Author(s):

Chin-Kun Wang ◽

Lu-Min Liu ◽

Marvin Liao ◽

Huang-Chung Cheng ◽

Mou-Shiung Lin

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Nitride ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Nitride Film ◽

Barrier Metal ◽

Titanium Nitride Film ◽

Metalorganic Chemical

Download Full-text

Copper metalorganic chemical vapor deposition reactions of hexafluoroacetylacetonate Cu(I) vinyltrimethylsilane and bis (hexafluoroacetylacetonate) Cu(II) adsorbed on titanium nitride

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578721 ◽

1993 ◽

Vol 11 (1) ◽

pp. 66-77 ◽

Cited By ~ 55

Author(s):

V. M. Donnelly ◽

M. E. Gross

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Nitride ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

Download Full-text

X-Ray Photoelectron Spectroscopy Studies of Titanium Nitride Barrier Metals Prepared by Low-Pressure Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.l907 ◽

1995 ◽

Vol 34 (Part 2, No. 7B) ◽

pp. L907-L910 ◽

Cited By ~ 6

Author(s):

Y. H. Chang ◽

S. J. Won ◽

J.E.Oh ◽

S. H. Paek ◽

H.D.Lee ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Nitride ◽

Vapor Deposition ◽

Photoelectron Spectroscopy ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

X Ray ◽

Spectroscopy Studies ◽

Metalorganic Chemical

Download Full-text

Abnormal InGaN growth behavior in indium-desorption regime in metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2014.09.049 ◽

2015 ◽

Vol 409 ◽

pp. 51-55 ◽

Cited By ~ 18

Author(s):

Kun Zhou ◽

Masao Ikeda ◽

Jianping Liu ◽

Shuming Zhang ◽

Zengcheng Li ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Growth Behavior ◽

Metalorganic Chemical

Download Full-text

Properties of titanium nitride thin films deposited by rapid‐thermal‐low‐pressure‐metalorganic‐chemical‐vapor‐deposition technique using tetrakis (dimethylamido) titanium precursor

Journal of Applied Physics ◽

10.1063/1.349214 ◽

1991 ◽

Vol 70 (7) ◽

pp. 3666-3677 ◽

Cited By ~ 40

Author(s):

A. Katz ◽

A. Feingold ◽

S. J. Pearton ◽

S. Nakahara ◽

M. Ellington ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Titanium Nitride ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Metalorganic Chemical

Download Full-text