Tantalum metallization using an electron–cyclotron-resonance plasma source coupled with divided microwaves

1997 ◽  
Vol 15 (3) ◽  
pp. 707-711 ◽  
Author(s):  
H. Nishimura ◽  
T. Ono ◽  
M. Oda ◽  
S. Matsuo
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