Effects of substrate bias frequency in an electron cyclotron resonance plasma reactor

1993 ◽  
Vol 11 (6) ◽  
pp. 2897-2902 ◽  
Author(s):  
J. B. O. Caughman ◽  
W. M. Holber
1990 ◽  
Vol 57 (12) ◽  
pp. 1188-1190 ◽  
Author(s):  
Dennis J. Trevor ◽  
Nader Sadeghi ◽  
Toshiki Nakano ◽  
Jacques Derouard ◽  
Richard A. Gottscho ◽  
...  

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