Monte Carlo simulation of surface kinetics during plasma enhanced chemical vapor deposition of SiO2 using oxygen/tetraethoxysilane chemistry

1993 ◽  
Vol 11 (5) ◽  
pp. 2562-2571 ◽  
Author(s):  
Phillip J. Stout ◽  
Mark J. Kushner
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Surface Kinetics

Investigation of optical emission spectroscopy in diamond chemical vapor deposition by Monte Carlo simulation

2008 ◽  
Vol 6 (3) ◽  
pp. 218-221
Author(s):  
王志军 Zhijun Wang ◽  
董丽芳 Lifang Dong ◽  
李盼来 Panlai Li ◽  
尚勇 Yong Shang ◽  
何寿杰 Shoujie He
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Chemical Vapor ◽  
Optical Emission ◽  
Diamond Chemical Vapor Deposition

A Monte Carlo simulation of silicon nitride thin film microstructure in ultraviolet localized-chemical vapor deposition

1998 ◽  
Vol 10 (1-4) ◽  
pp. 116-126 ◽  
Author(s):  
J. Flicstein ◽  
S. Pata ◽  
J.M. Le Solliec ◽  
L.S. How Kee Chun ◽  
J.F. Palmier ◽  
...  
Keyword(s):  
Thin Film ◽  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Chemical Vapor Deposition ◽  
Silicon Nitride ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Film Microstructure
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