Effects of predeposition HF/NH4F treatments on the electrical properties of SiO2/Si structures formed by low‐temperature plasma‐assisted oxidation and deposition processes

T. Yasuda; Y. Ma; Y. L. Chen; G. Lucovsky; D. Maher

doi:10.1116/1.578573

Effects of predeposition HF/NH4F treatments on the electrical properties of SiO2/Si structures formed by low‐temperature plasma‐assisted oxidation and deposition processes

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578573 ◽

1993 ◽

Vol 11 (4) ◽

pp. 945-951 ◽

Cited By ~ 12

Author(s):

T. Yasuda ◽

Y. Ma ◽

Y. L. Chen ◽

G. Lucovsky ◽

D. Maher

Keyword(s):

Electrical Properties ◽

Low Temperature ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Deposition Processes

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Effect of low-temperature plasma on the electrical properties of poly(ethylene terephthalate) film

Polimery ◽

10.14314/polimery.1988.228 ◽

1988 ◽

Vol 33 (06) ◽

pp. 228-231 ◽

Cited By ~ 1

Author(s):

WIESLAWA URBANIAK-DOMAGALA ◽

GRZEGORZ URBANCZYK

Keyword(s):

Electrical Properties ◽

Low Temperature ◽

Ethylene Terephthalate ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Poly Ethylene Terephthalate ◽

Poly Ethylene

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X-ray photoelectron spectra of low temperature plasma anodized Si0.84Ge0.16 alloy on Si(100): Implications for SiGe oxidation kinetics and oxide electrical properties

Journal of Applied Physics ◽

10.1063/1.370201 ◽

1999 ◽

Vol 85 (9) ◽

pp. 6828-6837 ◽

Cited By ~ 29

Author(s):

L. S. Riley ◽

S. Hall

Keyword(s):

Electrical Properties ◽

Low Temperature ◽

Oxidation Kinetics ◽

Photoelectron Spectra ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

X Ray

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High deposition rates for microcrystalline silicon with low temperature plasma enhanced chemical vapor deposition processes

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(98)00343-3 ◽

1998 ◽

Vol 227-230 ◽

pp. 861-865 ◽

Cited By ~ 18

Author(s):

P Hapke ◽

F Finger

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Temperature Plasma ◽

Microcrystalline Silicon ◽

Temperature Plasma ◽

Deposition Rates ◽

Deposition Processes

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Influence of Low Temperature Plasma Treatment on the surface, Optical and DC Electrical Properties of jute

IOSR Journal of Applied Physics ◽

10.9790/4861-0151622 ◽

2012 ◽

Vol 1 (5) ◽

pp. 16-22 ◽

Cited By ~ 2

Author(s):

Md. Masroor Anwer

Keyword(s):

Electrical Properties ◽

Low Temperature ◽

Plasma Treatment ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Surface Optical ◽

Dc Electrical Properties

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Electrical properties of low-temperature plasma in a strong magnetic field

2012 International Conference on Actual Problems of Electron Devices Engineering ◽

10.1109/apede.2012.6478059 ◽

2012 ◽

Author(s):

R.O. Abrahin ◽

A.S. Bankovsky ◽

A.A. Zaharov

Keyword(s):

Magnetic Field ◽

Electrical Properties ◽

Low Temperature ◽

Strong Magnetic Field ◽

Low Temperature Plasma ◽

Temperature Plasma

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Low temperature plasma-assisted oxidation and thin-film deposition processes for forming device-quality SiO2/Si and composite dielectric-SiO2/Si heterostructures

Thin Solid Films ◽

10.1016/0040-6090(92)90545-m ◽

1992 ◽

Vol 220 (1-2) ◽

pp. 38-44 ◽

Cited By ~ 2

Author(s):

G. Lucovsky ◽

T. Yasuda ◽

Y. Ma ◽

S. Habermehl ◽

S.S. He ◽

...

Keyword(s):

Thin Film ◽

Low Temperature ◽

Thin Film Deposition ◽

Film Deposition ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Deposition Processes

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Nonequilibrium low temperature plasma in process of collagen containing polymer materials electrical properties modification

Journal of Physics Conference Series ◽

10.1088/1742-6596/1588/1/012031 ◽

2020 ◽

Vol 1588 ◽

pp. 012031

Author(s):

L Yu Makhotkina ◽

V Bil ◽

V I Khristoliubova

Keyword(s):

Electrical Properties ◽

Low Temperature ◽

Polymer Materials ◽

Low Temperature Plasma ◽

Temperature Plasma

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Local atomic structure and electrical properties of nitrided SiSiO2 interfaces produced by low-temperature plasma processing and rapid thermal annealing, and explained by ab-initio quantum chemistry calculations

Applied Surface Science ◽

10.1016/s0169-4332(96)00167-5 ◽

1996 ◽

Vol 104-105 ◽

pp. 335-341 ◽

Cited By ~ 6

Author(s):

G. Lucovsky ◽

D.R. Lee ◽

S.V. Hattangady ◽

H. Niimi ◽

S. Gandhi ◽

...

Keyword(s):

Electrical Properties ◽

Low Temperature ◽

Quantum Chemistry ◽

Ab Initio ◽

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Atomic Structure ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Quantum Chemistry Calculations

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Formation of Si/SiO2 Heterostructures by Low-Temperature, Plasma-Assisted Oxidation and Deposition Processes

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2 ◽

10.1007/978-1-4899-1588-7_16 ◽

1993 ◽

pp. 145-156

Author(s):

G. Lucovsky ◽

Yi Ma ◽

T. Yasuda ◽

S. Habermehl

Keyword(s):

Low Temperature ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Deposition Processes

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A 2MHz, 2kW Voltage-Source Inverter for Low-Temperature Plasma Generators

IEEJ Transactions on Industry Applications ◽

10.1541/ieejias.117.1262 ◽

1997 ◽

Vol 117 (10) ◽

pp. 1262-1268 ◽

Cited By ~ 1

Author(s):

Hideaki Fujita ◽

Hirofumi Akagi

Keyword(s):

Low Temperature ◽

Voltage Source ◽

Low Temperature Plasma ◽

Voltage Source Inverter ◽

Temperature Plasma ◽

Plasma Generators

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