Spectroscopic immersion ellipsometry study of the mechanism of Si/SiO2 interface annealing

V. A. Yakovlev; Q. Liu; E. A. Irene

doi:10.1116/1.578166

Spectroscopic immersion ellipsometry study of the mechanism of Si/SiO2 interface annealing

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578166 ◽

1992 ◽

Vol 10 (3) ◽

pp. 427-433 ◽

Cited By ~ 32

Author(s):

V. A. Yakovlev ◽

Q. Liu ◽

E. A. Irene

Keyword(s):

Spectroscopic Immersion Ellipsometry

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A spectroscopic immersion ellipsometry study of SiO2-Si interface roughness for electron cyclotron resonance plasma and thermally oxidized Si surfaces

Thin Solid Films ◽

10.1016/s0040-6090(97)00834-1 ◽

1998 ◽

Vol 313-314 ◽

pp. 286-291 ◽

Cited By ~ 18

Author(s):

C. Zhao ◽

P.R. Lefebvre ◽

E.A. Irene

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Interface Roughness ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma ◽

Spectroscopic Immersion Ellipsometry

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Si/SiO2 interface studies by spectroscopic immersion ellipsometry and atomic force microscopy

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579081 ◽

1994 ◽

Vol 12 (5) ◽

pp. 2625-2629 ◽

Cited By ~ 29

Author(s):

Q. Liu ◽

J. F. Wall ◽

E. A. Irene

Keyword(s):

Atomic Force Microscopy ◽

Force Microscopy ◽

Atomic Force ◽

Spectroscopic Immersion Ellipsometry

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Measurement of N in nitrided oxides using spectroscopic immersion ellipsometry

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589212 ◽

1996 ◽

Vol 14 (3) ◽

pp. 1697 ◽

Cited By ~ 6

Author(s):

E. A. Irene

Keyword(s):

Spectroscopic Immersion Ellipsometry

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