Optimization of primary beam conditions for secondary ion mass spectrometry depth profiling of shallow junctions in silicon using a Cameca IMS‐3f

1990 ◽  
Vol 8 (3) ◽  
pp. 2323-2328 ◽  
Author(s):  
J. L. Hunter ◽  
S. F. Corcoran ◽  
D. P. Griffis ◽  
C. M. Osburn
Keyword(s):  
Mass Spectrometry ◽  
Secondary Ion Mass Spectrometry ◽  
Depth Profiling ◽  
Primary Beam ◽  
Shallow Junctions ◽  
Ion Mass Spectrometry ◽  
Secondary Ion

Round-robin test for the measurement of layer thickness of multilayer films by secondary ion mass spectrometry depth profiling

2017 ◽  
Vol 49 (11) ◽  
pp. 1057-1063 ◽  
Author(s):  
Kyung Joong Kim ◽  
Jong Shik Jang ◽  
Joe Bennett ◽  
David Simons ◽  
Mario Barozzi ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Layer Thickness ◽  
Secondary Ion Mass Spectrometry ◽  
Depth Profiling ◽  
Multilayer Films ◽  
Round Robin ◽  
Round Robin Test ◽  
Ion Mass Spectrometry ◽  
Secondary Ion
Sign in / Sign up

Export Citation Format

Share Document