Summary Abstract: Characterization of H2O plasma treated nickel oxide by angle resolved x‐ray photoelectron spectroscopy
1988 ◽
Vol 6
(3)
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pp. 1074-1075
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2014 ◽
Vol 34
(3)
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pp. 841-849
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2003 ◽
Vol 18
(5)
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pp. 1123-1130
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