Properties of silicon and aluminum oxide thin films deposited by dual ion beam sputtering

G. Emiliani; S. Scaglione

doi:10.1116/1.574507

Properties of silicon and aluminum oxide thin films deposited by dual ion beam sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.574507 ◽

1987 ◽

Vol 5 (4) ◽

pp. 1824-1827 ◽

Cited By ~ 21

Author(s):

G. Emiliani ◽

S. Scaglione

Keyword(s):

Thin Films ◽

Aluminum Oxide ◽

Ion Beam ◽

Ion Beam Sputtering ◽

Oxide Thin Films ◽

Beam Sputtering ◽

Dual Ion Beam Sputtering

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Interdependence between stress, preferred orientation, and surface morphology of nanocrystalline TiN thin films deposited by dual ion beam sputtering

Journal of Applied Physics ◽

10.1063/1.2197287 ◽

2006 ◽

Vol 99 (11) ◽

pp. 113519 ◽

Cited By ~ 90

Author(s):

G. Abadias ◽

Y. Y. Tse ◽

Ph. Guérin ◽

V. Pelosin

Keyword(s):

Thin Films ◽

Surface Morphology ◽

Ion Beam ◽

Preferred Orientation ◽

Ion Beam Sputtering ◽

Beam Sputtering ◽

Tin Thin Films ◽

Dual Ion Beam Sputtering

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Epitaxial growth of MgO thin films on silicon by dual ion beam sputtering

Thin Solid Films ◽

10.1016/0040-6090(93)90720-a ◽

1993 ◽

Vol 223 (1) ◽

pp. 11-13 ◽

Cited By ~ 13

Author(s):

Yijie Li ◽

Guangcheng Xiong ◽

Guijun Lian ◽

Jie Li ◽

Zizhao Gan

Keyword(s):

Thin Films ◽

Epitaxial Growth ◽

Ion Beam ◽

Ion Beam Sputtering ◽

Beam Sputtering ◽

Dual Ion Beam Sputtering

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Effect of assist ion beam voltage on intrinsic stress and optical properties of Ta2O5 thin films deposited by dual ion beam sputtering

Thin Solid Films ◽

10.1016/j.tsf.2007.08.051 ◽

2008 ◽

Vol 516 (11) ◽

pp. 3582-3585 ◽

Cited By ~ 4

Author(s):

S.G. Yoon ◽

S.M. Kang ◽

W.S. Jung ◽

S.-W. Kim ◽

D.H. Yoon

Keyword(s):

Thin Films ◽

Optical Properties ◽

Ion Beam ◽

Intrinsic Stress ◽

Ion Beam Sputtering ◽

Beam Voltage ◽

Beam Sputtering ◽

Dual Ion Beam Sputtering

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Hard BCxNy thin films grown by dual ion beam sputtering

Thin Solid Films ◽

10.1016/j.tsf.2005.12.063 ◽

2006 ◽

Vol 515 (1) ◽

pp. 207-211 ◽

Cited By ~ 37

Author(s):

C. Morant ◽

P. Prieto ◽

J. Bareño ◽

J.M. Sanz ◽

E. Elizalde

Keyword(s):

Thin Films ◽

Ion Beam ◽

Ion Beam Sputtering ◽

Beam Sputtering ◽

Dual Ion Beam Sputtering

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Room temperature synthesis of boron nitride thin films by dual-ion beam sputtering deposition

Ceramics International ◽

10.1016/j.ceramint.2015.11.090 ◽

2016 ◽

Vol 42 (3) ◽

pp. 4171-4175 ◽

Cited By ~ 1

Author(s):

Z.F. Wu ◽

L. Guo ◽

K. Cheng ◽

F. Zhang ◽

R.F. Guan

Keyword(s):

Thin Films ◽

Boron Nitride ◽

Room Temperature ◽

Ion Beam ◽

Ion Beam Sputtering ◽

Temperature Synthesis ◽

Sputtering Deposition ◽

Room Temperature Synthesis ◽

Beam Sputtering ◽

Dual Ion Beam Sputtering

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Processing of La1.8Sr0.2CuO4and YBa2Cu3O7superconducting thin films by dual‐ion‐beam sputtering

Journal of Applied Physics ◽

10.1063/1.341106 ◽

1988 ◽

Vol 63 (6) ◽

pp. 2046-2053 ◽

Cited By ~ 68

Author(s):

P. Madakson ◽

J. J. Cuomo ◽

D. S. Yee ◽

R. A. Roy ◽

G. Scilla

Keyword(s):

Thin Films ◽

Ion Beam ◽

Ion Beam Sputtering ◽

Beam Sputtering ◽

Dual Ion Beam Sputtering

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Iron Thin Films by Means of Dual Ion-Beam Sputtering

IEEE Translation Journal on Magnetics in Japan ◽

10.1109/tjmj.1985.4548833 ◽

1985 ◽

Vol 1 (4) ◽

pp. 488-490

Author(s):

M. Yamaga ◽

N. Terada ◽

M. Naoe

Keyword(s):

Thin Films ◽

Ion Beam ◽

Ion Beam Sputtering ◽

Beam Sputtering ◽

Dual Ion Beam Sputtering

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Mechanical and thermoelastic characteristics of optical thin films deposited by dual ion beam sputtering

Applied Optics ◽

10.1364/ao.48.004536 ◽

2009 ◽

Vol 48 (23) ◽

pp. 4536 ◽

Cited By ~ 45

Author(s):

Eda Çetinörgü ◽

Bill Baloukas ◽

Oleg Zabeida ◽

Jolanta E. Klemberg-Sapieha ◽

Ludvik Martinu

Keyword(s):

Thin Films ◽

Ion Beam ◽

Ion Beam Sputtering ◽

Beam Sputtering ◽

Thermoelastic Characteristics ◽

Dual Ion Beam Sputtering

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Characteristics of AlN Thin Films Deposited by Electron Cyclotron Resonance Dual-Ion-Beam Sputtering and Their Application to GHz-Band Surface Acoustic Wave Devices

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.2957 ◽

1994 ◽

Vol 33 (Part 1, No. 5B) ◽

pp. 2957-2961 ◽

Cited By ~ 14

Author(s):

Hiroshi Okano ◽

Naoki Tanaka ◽

Yasuhiro Hirao ◽

Yasumi Kobayashi ◽

Kenichi Shibata ◽

...

Keyword(s):

Thin Films ◽

Acoustic Wave ◽

Surface Acoustic Wave ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Ion Beam ◽

Ion Beam Sputtering ◽

Beam Sputtering ◽

Acoustic Wave Devices ◽

Dual Ion Beam Sputtering

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TfC16. Growth of perovksite PLZT thin films by dual ion beam sputtering

Ferroelectrics ◽

10.1080/00150199208015603 ◽

1992 ◽

Vol 134 (1) ◽

pp. 297-302 ◽

Cited By ~ 5

Author(s):

D. A. Tossell ◽

N. M. Shorrocks ◽

J. S. Obhi ◽

R. W. Whatmore

Keyword(s):

Thin Films ◽

Ion Beam ◽

Ion Beam Sputtering ◽

Beam Sputtering ◽

Plzt Thin Films ◽

Dual Ion Beam Sputtering

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