Interdependence between stress, preferred orientation, and surface morphology of nanocrystalline TiN thin films deposited by dual ion beam sputtering
Keyword(s):
Ion Beam
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2016 ◽
Vol 42
(3)
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pp. 4171-4175
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1994 ◽
Vol 33
(Part 1, No. 5B)
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pp. 2957-2961
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