Pressure effects in planar magnetron sputter deposition

1986 ◽  
Vol 4 (3) ◽  
pp. 408-412 ◽  
Author(s):  
J. C. Helmer ◽  
C. E. Wickersham
Keyword(s):  
Sputter Deposition ◽  
Pressure Effects ◽  
Planar Magnetron ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter

scholarly journals Collimated Magnetron Sputter Deposition for Mirror Coatings

2008 ◽  
Vol 2008 ◽  
pp. 1-9 ◽  
Author(s):  
Anette Vickery ◽  
Carsten P. Jensen ◽  
Finn E. Christensen ◽  
Mads Peter Steenstrup ◽  
Troels Schønfeldt
Keyword(s):  
Magnetron Sputtering ◽  
Experimental Evidence ◽  
Sputter Deposition ◽  
X Ray ◽  
National Space ◽  
Planar Magnetron ◽  
Different Types ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter ◽  
Present Experimental Evidence

At the Danish National Space Center (DNSC), a planar magnetron sputtering chamber has been established as a research and production coating facility for curved X-ray mirrors for hard X-ray optics for astronomical X-ray telescopes. In the following, we present experimental evidence that a collimation of the sputtered particles is an efficient way to suppress the interfacial roughness of the produced multilayer. We present two different types of collimation optimized for the production of low roughness curved mirrors and flat mirrors, respectively.

Crystallization of Cu-Zr and Cu-TI Metallic Glasses

1982 ◽  
Vol 40 ◽  
pp. 714-717
Author(s):  
A. F. Marshall ◽  
Y. S. Lee ◽  
R. G. Walmsley
Keyword(s):  
Crystallization Kinetics ◽  
Metallic Glasses ◽  
Amorphous State ◽  
Sputter Deposition ◽  
Crystallization Sequence ◽  
Ti Alloys ◽  
Planar Magnetron ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter ◽  
Equilibrium Phases

Studies of the crystallization of metallic glasses provide information concerning structure and stability of the amorphous state as well as data on metastable transitions, crystallization kinetics, and equilibrium phases. AEM techniques can prove invaluable in elucidating details of the crystallization sequence. Results are shown for Cu-Zr and Cu-Ti alloys prepared by the vapor quench technique of planar magnetron sputter deposition.

Energetic particle fluxes in magnetron sputter deposition of a-Si:H

1991 ◽  
Vol 137-138 ◽  
pp. 783-786 ◽  
Author(s):  
Alan M. Myers ◽  
James R. Doyle ◽  
G. Jeff Feng ◽  
Nagi Maley ◽  
David L. Ruzic ◽  
...  
Keyword(s):  
Energetic Particle ◽  
Sputter Deposition ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter ◽  
Particle Fluxes

Properties of Al Films Depend on Substrate Temperature by DC Magnetron Sputter Deposition

2013 ◽  
Vol 662 ◽  
pp. 413-416
Author(s):  
Yi Shen ◽  
Ruo He Yao
Keyword(s):  
Grain Size ◽  
Film Thickness ◽  
Substrate Temperature ◽  
Sheet Resistance ◽  
Cross Section ◽  
Sputter Deposition ◽  
Surface Profiling ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter ◽  
Substrate Temperatures

Al films were prepared by DC magnetron sputter deposition at different substrate temperatures. The sheet resistance of the films was measured by four point probe sheet resistance meter, and the film thickness, which was obtained by surface profiling system. The surface and cross-section morphology of the films was observed by AFM and FESEM. As a result, the resistivity of the films decreases obviously as the substrate temperature increases gradually. The higher substrate temperature is, the rougher the films surface is and the larger the grain size is.

Controlling the deposition rate during target erosion in reactive pulsed DC magnetron sputter deposition of alumina

2012 ◽  
Vol 206 (23) ◽  
pp. 4850-4854 ◽  
Author(s):  
N.D. Madsen ◽  
B.H. Christensen ◽  
S. Louring ◽  
A.N. Berthelsen ◽  
K.P. Almtoft ◽  
...  
Keyword(s):  
Deposition Rate ◽  
Sputter Deposition ◽  
Pulsed Dc ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter
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