Infrared spectroscopic study of SiOx films produced by plasma enhanced chemical vapor deposition

P. G. Pai; S. S. Chao; Y. Takagi; G. Lucovsky

doi:10.1116/1.573833

Infrared spectroscopic study of SiOx films produced by plasma enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.573833 ◽

1986 ◽

Vol 4 (3) ◽

pp. 689-694 ◽

Cited By ~ 660

Author(s):

P. G. Pai ◽

S. S. Chao ◽

Y. Takagi ◽

G. Lucovsky

Keyword(s):

Chemical Vapor Deposition ◽

Spectroscopic Study ◽

Vapor Deposition ◽

Chemical Vapor ◽

Infrared Spectroscopic Study ◽

Infrared Spectroscopic

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Fourier transform infrared spectroscopic study of predeposition reactions in metalloorganic chemical vapor deposition of gallium nitride

Chemistry of Materials ◽

10.1021/cm00016a031 ◽

1991 ◽

Vol 3 (4) ◽

pp. 737-742 ◽

Cited By ~ 39

Author(s):

B. S. Sywe ◽

J. R. Schlup ◽

James H. Edgar

Keyword(s):

Fourier Transform ◽

Gallium Nitride ◽

Chemical Vapor Deposition ◽

Spectroscopic Study ◽

Vapor Deposition ◽

Chemical Vapor ◽

Fourier Transform Infrared ◽

Infrared Spectroscopic Study ◽

Infrared Spectroscopic

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Fourier transform infrared spectroscopic study of predeposition reactions in metalloorganic chemical vapor deposition of gallium nitride. 2

Chemistry of Materials ◽

10.1021/cm00018a027 ◽

1991 ◽

Vol 3 (6) ◽

pp. 1093-1097 ◽

Cited By ~ 10

Author(s):

B. S. Sywe ◽

J. R. Schlup ◽

J. H. Edgar

Keyword(s):

Fourier Transform ◽

Gallium Nitride ◽

Chemical Vapor Deposition ◽

Spectroscopic Study ◽

Vapor Deposition ◽

Chemical Vapor ◽

Fourier Transform Infrared ◽

Infrared Spectroscopic Study ◽

Infrared Spectroscopic

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Infrared Spectroscopic Study on Deposition Process of the Amorphous Carbon Film with Benzene Molecule as a Source in Plasma Enhanced Chemical Vapor Deposition

Proceedings of the 12th Asia Pacific Physics Conference (APPC12) ◽

10.7566/jpscp.1.015081 ◽

2014 ◽

Cited By ~ 1

Author(s):

Masanori Shinohara ◽

Yujiro Taniguchi ◽

Yuya Takaki ◽

Shohei Yagi ◽

Yoshinobu Matsuda ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Spectroscopic Study ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Deposition Process ◽

Benzene Molecule ◽

Infrared Spectroscopic Study ◽

Amorphous Carbon Film

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In situ infrared spectroscopic study on the role of surface hydrides and fluorides in the silicon chemical vapor deposition process

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579470 ◽

1995 ◽

Vol 13 (6) ◽

pp. 2698-2702 ◽

Cited By ~ 2

Author(s):

Chan‐Hwa Chung ◽

Sang Heup Moon ◽

Shi‐Woo Rhee

Keyword(s):

Chemical Vapor Deposition ◽

Spectroscopic Study ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Infrared Spectroscopic Study ◽

Vapor Deposition Process

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Spectroscopic Study on Plasma-Enhanced Chemical Vapor Deposition of YBa2Cu3OxSuperconducting Thin Films

Japanese Journal of Applied Physics ◽

10.1143/jjap.30.48 ◽

1991 ◽

Vol 30 (Part 1, No. 1) ◽

pp. 48-51 ◽

Cited By ~ 7

Author(s):

Nobuyuki Sugii ◽

Kazushige Imagawa ◽

Sakae Saito ◽

Keiichi Kanehori

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Spectroscopic Study ◽

Vapor Deposition ◽

Chemical Vapor

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Metal−Organic Chemical Vapor Deposition of Palladium: Spectroscopic Study of Cyclopentadienyl-allyl-palladium Deposition on a Palladium Substrate

Chemistry of Materials ◽

10.1021/cm048798z ◽

2005 ◽

Vol 17 (4) ◽

pp. 861-868 ◽

Cited By ~ 9

Author(s):

Arno Niklewski ◽

Thomas Strunskus ◽

Gregor Witte ◽

Christof Wöll

Keyword(s):

Chemical Vapor Deposition ◽

Spectroscopic Study ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Spectroscopic study of plasma‐enhanced organometallic chemical vapor deposition for superconducting thin film formation

Journal of Applied Physics ◽

10.1063/1.346710 ◽

1990 ◽

Vol 68 (3) ◽

pp. 1151-1156 ◽

Cited By ~ 8

Author(s):

Kenji Ebihara ◽

Seiji Kanazawa ◽

Tomoaki Ikegami ◽

Masanobu Shiga

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Spectroscopic Study ◽

Vapor Deposition ◽

Film Formation ◽

Chemical Vapor ◽

Superconducting Thin Film ◽

Thin Film Formation ◽

Organometallic Chemical Vapor Deposition

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X-ray spectroscopic study of the electronic structure of boron carbonitride films obtained by chemical vapor deposition on Co/Si and CoO x /Si substrates

Journal of Structural Chemistry ◽

10.1134/s0022476612040117 ◽

2012 ◽

Vol 53 (4) ◽

pp. 690-698 ◽

Cited By ~ 2

Author(s):

Yu. V. Fedoseeva ◽

M. L. Kosinova ◽

S. A. Prokhorova ◽

I. S. Merenkov ◽

L. G. Bulusheva ◽

...

Keyword(s):

Electronic Structure ◽

Chemical Vapor Deposition ◽

Spectroscopic Study ◽

Vapor Deposition ◽

Chemical Vapor ◽

Boron Carbonitride ◽

X Ray ◽

Si Substrates

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In SituIR Spectroscopic Study of a-Si:H Films Growing under Photo-Chemical Vapor Deposition Condition

Japanese Journal of Applied Physics ◽

10.1143/jjap.27.501 ◽

1988 ◽

Vol 27 (Part 1, No. 4) ◽

pp. 501-505 ◽

Cited By ~ 39

Author(s):

Toshimasa Wadayama ◽

Wataru Suëtaka ◽

Atsushi Sekiguchi

Keyword(s):

Chemical Vapor Deposition ◽

Spectroscopic Study ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Condition

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In situ infrared spectroscopic ellipsometry for blanket aluminum chemical vapor deposition on TiN and on SiO2/Si

Thin Solid Films ◽

10.1016/s0040-6090(97)00988-7 ◽

1998 ◽

Vol 313-314 ◽

pp. 737-741 ◽

Cited By ~ 1

Author(s):

M Weidner ◽

G Weidner ◽

A Hausmann ◽

G Ritter

Keyword(s):

Chemical Vapor Deposition ◽

Spectroscopic Ellipsometry ◽

Vapor Deposition ◽

Chemical Vapor ◽

Infrared Spectroscopic

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