A combined instrument for the investigation of catalytic reactions by means of gas chromatography, secondary ion and gas phase mass spectrometry, Auger and photoelectron spectroscopy, and ion scattering spectroscopy

1983 ◽  
Vol 1 (3) ◽  
pp. 1491-1506 ◽  
Author(s):  
O. Ganschow ◽  
R. Jede ◽  
L. D. An ◽  
E. Manske ◽  
J. Neelsen ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Gas Chromatography ◽  
Gas Phase ◽  
Photoelectron Spectroscopy ◽  
Catalytic Reactions ◽  
Ion Scattering ◽  
Ion Scattering Spectroscopy ◽  
Secondary Ion

ESCA for microelectronic applications

1983 ◽  
Vol 41 ◽  
pp. 168-169
Author(s):  
J. F. Moulder ◽  
J. M. Burkstrand ◽  
C. D. Wagner
Keyword(s):  
Surface Analysis ◽  
Photoelectron Spectroscopy ◽  
Structural Information ◽  
Ion Scattering ◽  
X Ray ◽  
Analysis Techniques ◽  
Microelectronic Devices ◽  
Surface Analysis Techniques ◽  
Ion Scattering Spectroscopy ◽  
Secondary Ion

As the dimensions of microelectronic devices continue to shrink, the use of surface sensitive analysis techniques to characterize thin film structures continues to grow. These techniques including: ESCA or XPS (X-ray photoelectron spectroscopy), AES (Auger electron spectroscopy), SIMS (secondary ion mass spectroscopy) and ISS (ion scattering spectroscopy) are now routinely being used to study a wide variety of material and process related problems.ESCA, which has become a standard analytical tool in the chemical industry, has not been utilized in the microelectronic industry to the extent that AES and SIMS have, even though it has the potential to provide more chemical state and structural information than other surface analysis techniques.ESCA like the other surface analysis techniques analyzes the outermost atomic layers of a solid surface (typically 5 to 50 Å in depth). A low energy X-ray source (Mg 1253.6 eV or Al 1486.7 eV) is used to bombard the sample causing electrons to be ejected from it. These photo-electrons are collected and analyzed to determine their kinetic energy.

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