Studies on an electron‐beam mask‐defect inspection system

1981 ◽  
Vol 19 (1) ◽  
pp. 36-39 ◽  
Author(s):  
Y. Wada ◽  
Y. Hisamoto ◽  
K. Mizukami ◽  
M. Migitaka
Keyword(s):  
Electron Beam ◽  
Inspection System ◽  
Defect Inspection

EPL stencil mask defect inspection system using transmission electron beam

2003 ◽  
Author(s):  
Jiro Yamamoto ◽  
Teruo Iwasaki ◽  
Masaki Yamabe ◽  
Norimichi Anazawa ◽  
Satoru Maruyama ◽  
...  
Keyword(s):  
Electron Beam ◽  
Inspection System ◽  
Defect Inspection ◽  
Transmission Electron ◽  
Stencil Mask

Native pattern defect inspection of EUV mask using advanced electron beam inspection system

2010 ◽  
Author(s):  
Takeya Shimomura ◽  
Yuichi Inazuki ◽  
Tsukasa Abe ◽  
Tadahiko Takikawa ◽  
Hiroshi Mohri ◽  
...  
Keyword(s):  
Electron Beam ◽  
Inspection System ◽  
Defect Inspection

Methodology to Correlate Defect Reduction Systems to Electrical Test Data via Artificially Manufactured Defects

2002 ◽  
Author(s):  
Mike Santana ◽  
Alfredo V. Herrera
Keyword(s):  
Test Data ◽  
Learning Opportunities ◽  
Inspection System ◽  
Navigation Systems ◽  
Defect Inspection ◽  
Defect Reduction ◽  
Electrical Test ◽  
Important System

Abstract This paper describes a methodology for correlating physical defect inspection/navigation systems with electrical bitmap data through the fabrication of artificial defects via reticle alterations or circuit modifications using an inline FIB. The methodology chosen consisted of altering decommissioned reticles to create defects resulting in both open and shorted circuits within areas of an AMD microprocessor cache. The reticles were subsequently scanned using a KLA SL300HR StarLight inspection system to confirm their location, while wafers processed on these reticles were scanned at several layers using standard inline metrology. Finally, the wafers were electrically tested, bitmapped, and physically deprocessed. All defect data was then analyzed and cross-correlated between each system, uncovering some important system deficiencies and learning opportunities. Data and images are included to support the significance and effectiveness of such a methodology.

Study and Realization of Camera Wafer Image Fusion Algorithm

2014 ◽  
Vol 484-485 ◽  
pp. 540-546
Author(s):  
Yi Xu
Keyword(s):  
Image Fusion ◽  
Ccd Camera ◽  
Inspection System ◽  
Defect Inspection ◽  
Fusion Algorithm ◽  
Field Range ◽  
Mosaic Image

Image mosaics not only can make the collected several original images regenerate a complete image, but also can correct the error caused by imaging distortion of the original images, which can achieve the objective of rapid and correct mosaic image. The program studies the image mosaics of wafer defect inspection system. For the problem that the field range taken by CCD camera under resolution of wafer defect inspection system is small, which cant get the whole wafer image once and influences the extraction of subsequent defect features, the study demands to add image mosaics to the system.

A Robotic Defect Inspection System for Free-form Specular Surfaces

2021 ◽  
Author(s):  
Shengzeng Huo ◽  
David Navarro-Alarcon ◽  
David TW Chik
Keyword(s):  
Free Form ◽  
Inspection System ◽  
Defect Inspection ◽  
Specular Surfaces

Real-Time Image-Based Defect Inspection System of Internal Thread for Nut

2019 ◽  
Vol 68 (8) ◽  
pp. 2830-2848
Author(s):  
Chun-Fu Lin ◽  
Sheng-Fuu Lin ◽  
Chi-Hung Hwang ◽  
Hao-Kai Tu ◽  
Chih-Yen Chen ◽  
...  
Keyword(s):  
Real Time ◽  
Inspection System ◽  
Internal Thread ◽  
Defect Inspection ◽  
Real Time Image ◽  
Time Image

Application of the SEMSpec electron-beam inspection system to in-process defect detection on semiconductor wafers

1996 ◽  
Vol 30 (1-4) ◽  
pp. 567-570 ◽  
Author(s):  
T.R. Cass ◽  
D. Hendricks ◽  
J. Jau ◽  
H.J. Dohse ◽  
A.D. Brodie ◽  
...  
Keyword(s):  
Electron Beam ◽  
Defect Detection ◽  
Inspection System
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