Magnetic sector atom‐probe field ion microscope with a retarding potential analyzer

1978 ◽  
Vol 15 (5) ◽  
pp. 1752-1755 ◽  
Author(s):  
Robert J. Culbertson ◽  
Toshio Sakurai
Keyword(s):  
Atom Probe ◽  
Probe Field ◽  
Magnetic Sector ◽  
Retarding Potential Analyzer ◽  
Field Ion Microscope

Fabrication and characterization - by High Resolution Electron Microscopy and atom probe microanalysis - of Co-based metallic multilayer films

1990 ◽  
Vol 48 (4) ◽  
pp. 772-773
Author(s):  
Amanda K. Petford-Long ◽  
A. Cerezo ◽  
M.G. Hetherington
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
High Resolution Electron Microscopy ◽  
Atom Probe ◽  
Multilayer Films ◽  
Interface Roughness ◽  
Probe Field ◽  
Resolution Electron ◽  
Potential Applications ◽  
Field Ion Microscope

The fabrication of multilayer films (MLF) with layer thicknesses down to one monolayer has led to the development of materials with unique properties not found in bulk materials. The properties of interest depend critically on the structure and composition of the films, with the interfacial regions between the layers being of particular importance. There are a number of magnetic MLF systems based on Co, several of which have potential applications as perpendicular magnetic (e.g Co/Cr) or magneto-optic (e.g. Co/Pt) recording media. Of particular concern are the effects of parameters such as crystallographic texture and interface roughness, which are determined by the fabrication conditions, on magnetic properties and structure.In this study we have fabricated Co-based MLF by UHV thermal evaporation in the prechamber of an atom probe field-ion microscope (AP). The multilayers were deposited simultaneously onto cobalt field-ion specimens (for AP and position-sensitive atom probe (POSAP) microanalysis without exposure to atmosphere) and onto the flat (001) surface of oxidised silicon wafers (for subsequent study in cross-section using high-resolution electron microscopy (HREM) in a JEOL 4000EX. Deposi-tion was from W filaments loaded with material in the form of wire (Co, Fe, Ni, Pt and Au) or flakes (Cr). The base pressure in the chamber was around 8×10−8 torr during deposition with a typical deposition rate of 0.05 - 0.2nm/s.

scholarly journals Atomic Level Characterization of the Morphology of Phases in Chromindur Magnetic Alloys

1991 ◽  
Vol 232 ◽  
Author(s):  
M. K Miller ◽  
P. P. Camus ◽  
M. G. Hetherington
Keyword(s):  
Atom Probe ◽  
Heat Treatments ◽  
Miscibility Gap ◽  
Probe Field ◽  
Magnet Alloy ◽  
Two Phases ◽  
Isothermal Heat Treatments ◽  
Field Ion Microscope ◽  
Permanent Magnet Alloy

ABSTRACTThe atom probe field ion microscope has been used to characterize the morphology and determine the compositions of the iron-rich a and chromium-enriched α′ phases produced during isothermal and step cooled heat treatments in a Chromindur II ductile permanent magnet alloy. The good magnetic properties of this material are due to a combination of the composition of the two phases and the isolated nature and size of the ferromagnetic a phase. The morphology of the a phase is produced as a result of the shape of the miscibility gap and the step-cooled heat treatment and is distinctly different from that formed during isothermal heat treatments.

Atom probe field ion microscope studies of palladium silicide on silicon

1995 ◽  
Vol 87-88 ◽  
pp. 279-283
Author(s):  
R.A. King ◽  
R.A.D. Mackenzie ◽  
G.D.W. Smith ◽  
N.A. Cade
Keyword(s):  
Atom Probe ◽  
Probe Field ◽  
Palladium Silicide ◽  
Field Ion Microscope

My Life With Erwin: The Beginning of an Atom-Probe Legacy

2019 ◽  
Vol 25 (2) ◽  
pp. 274-279
Author(s):  
John A. Panitz
Keyword(s):  
Field Emission ◽  
National Science Foundation ◽  
Atom Probe ◽  
Single Atom ◽  
National Bureau ◽  
State University ◽  
Pennsylvania State University ◽  
Probe Field ◽  
National Science ◽  
Field Ion Microscope

AbstractThe atom-probe field ion microscope was introduced in 1967 at the 14th Field Emission Symposium held at the National Bureau of Standards (now, NIST) in Gaithersburg, Maryland. The atom-probe field ion microscope was, and remains, the only instrument capable of determining “the nature of one single atom seen on a metal surface and selected from neighboring atoms at the discretion of the observer”. The development of the atom-probe is a story of an instrument that one National Science Foundation (NSF) reviewer called “impossible because single atoms could not be detected”. It is also a story of my life with Erwin Wilhelm Müller as his graduate student in the Field Emission Laboratory at the Pennsylvania State University in the late 1960s and his strong and volatile personality, perhaps fostered by his pedigree as Gustav Hertz’s student in the Berlin of the 1930s. It is the story that has defined by scientific career.

scholarly journals Spatial Resolution in the Atom Probe Field Ion Microscope

1997 ◽  
Vol 3 (S2) ◽  
pp. 1189-1190
Author(s):  
M. K. Miller
Keyword(s):  
Spatial Resolution ◽  
Atom Probe ◽  
Single Atom ◽  
Field Evaporation ◽  
Sensitive Detector ◽  
Probe Field ◽  
3 Dimensional ◽  
Number Of Factors ◽  
The Individual ◽  
Field Ion Microscope

The atom probe field ion microscope can resolve and identify individual atoms. This ability is demonstrated in a pair of field ion micrographs of an Ni3Al specimen, Fig. 1, in which the individual atoms on the close packed (111) plane are clearly resolved. Comparison of these two micrographs reveals that an individual atom was field evaporated between the micrographs. Due to the hemispherical nature of the specimen, the ability to resolve this two dimensional atomic arrangement is only possible on low index plane facets. The spatial resolution in field ion images is determined by a number of factors including specimen temperature, material, microstructural features, specimen geometry, and crystallographic location.The spatial resolution of the data obtained in atom probe and 3 dimensional atom probe compositional analyses can be evaluated with the use of field evaporation or field desorption images. The field evaporation images are formed from the surface atoms with the use of a single atom sensitive detector whereas the field ion image is formed from the projection of a continuous supply of ionized image gas atoms.

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