Quantitative analysis of thin oxide films using x‐ray photoelectron spectroscopy and rastered ion bombardment

1977 ◽  
Vol 14 (1) ◽  
pp. 181-185 ◽  
Author(s):  
N. S. McIntyre ◽  
D. G. Zetaruk
Keyword(s):  
Quantitative Analysis ◽  
Photoelectron Spectroscopy ◽  
Oxide Films ◽  
Ion Bombardment ◽  
X Ray ◽  
Thin Oxide Films ◽  
Thin Oxide

X-ray Diffraction of Thin Oxide Films on Soldered Module Pins

1988 ◽  
Vol 32 ◽  
pp. 303-310
Author(s):  
T. Paul Adi ◽  
H. F. Stehmeyer
Keyword(s):  
Oxide Films ◽  
Interplanar Distance ◽  
X Ray Diffraction ◽  
Metal Oxide Films ◽  
X Ray ◽  
Highly Sensitive ◽  
Thin Oxide Films ◽  
Thin Oxide ◽  
Diffraction Patterns

AbstractThe presence of metal oxide films from wave solder baths on timed module pins are partly responsible for non-wet problems in subsequent soldering steps. The cylindrical geometry of the pins lends itself to the characterization of thin oxide films by using the highly sensitive Debye-Scherrer camera method. As confirmed by Electron Hicroprobe Analysis (EMA), pins containing thin oxide films were used to obtain the diffraction patterns. A software program was developed that subtracts the diffraction angles of an oxids-free control pin from the pattern of the contaminated pin, and tabulates the residual d-spacing (interplanar distance) of the contaminant film.

scholarly journals A method for accurate texture determination of thin oxide films by glancing-angle laboratory X-ray diffraction

2014 ◽  
Vol 47 (2) ◽  
pp. 575-583 ◽  
Author(s):  
Alistair Garner ◽  
Michael Preuss ◽  
Philipp Frankel
Keyword(s):  
Oxide Films ◽  
X Ray Diffraction ◽  
Aqueous Corrosion ◽  
Texture Measurement ◽  
X Ray ◽  
Peak Broadening ◽  
Glancing Angle ◽  
Thin Oxide Films ◽  
Diffraction Peaks ◽  
Thin Oxide

The present article describes a modification to the standard method of glancing-angle X-ray diffraction for accurate measurement of the texture of thin oxide films. The technique resolves the problems caused by overlapping diffraction peaks originating from multiphase materials with asymmetric unit cells and the peak broadening associated with sample tilt during glancing-angle texture measurement. The entire 2θ range of interest is recorded as a function of sample orientation, and the integrated intensities from different crystallographic planes are extracted from fitted diffraction profiles. The technique allows for pole figures to be plotted from diffraction peaks that could otherwise not be resolved and separates contributions from neighbouring peaks, leading to a more accurate representation of the existing oxide texture. The proposed method has been used for determining texture in a 3 µm layer of monoclinic/tetragonal zirconium oxide grown during aqueous corrosion testing and has been verified by additional synchrotron X-ray diffraction measurements.

Quantitative X‐Ray Emission Analysis of Thin Oxide Films on Tantalum

1971 ◽  
Vol 42 (13) ◽  
pp. 5879-5882 ◽  
Author(s):  
P. B. Sewell ◽  
D. F. Mitchell
Keyword(s):  
Oxide Films ◽  
Emission Analysis ◽  
X Ray ◽  
Thin Oxide Films ◽  
Thin Oxide
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