Mechanism of highly selective SiO2 etching over Si3N4 using a cyclic process with BCl3 and fluorocarbon gas chemistries
2020 ◽
Vol 38
(2)
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pp. 023004
1973 ◽
Vol 95
(18)
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pp. 6145-6146
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1991 ◽
Vol 113
(2)
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pp. 254-262
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Keyword(s):
2004 ◽
Vol 17
(1)
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pp. 22-24
1998 ◽
Vol 16
(2)
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pp. 502-508
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Keyword(s):