scholarly journals In situ x-ray photoelectron spectroscopy study of lithium carbonate removal from garnet-type solid-state electrolyte using ultra high vacuum techniques

2020 ◽  
Vol 38 (2) ◽  
pp. 023201 ◽  
Author(s):  
Jessica C. Jones ◽  
Sathish Rajendran ◽  
Aparna Pilli ◽  
Veronica Lee ◽  
Natasha Chugh ◽  
...  
Keyword(s):  
Solid State ◽  
Photoelectron Spectroscopy ◽  
High Vacuum ◽  
Lithium Carbonate ◽  
Ultra High Vacuum ◽  
Spectroscopy Study ◽  
Solid State Electrolyte ◽  
X Ray

Electron induced surface reactions of (η5-C5H5)Fe(CO)2Mn(CO)5, a potential heterobimetallic precursor for focused electron beam induced deposition (FEBID)

2018 ◽  
Vol 20 (11) ◽  
pp. 7862-7874 ◽  
Author(s):  
Ilyas Unlu ◽  
Julie A. Spencer ◽  
Kelsea R. Johnson ◽  
Rachel M. Thorman ◽  
Oddur Ingólfsson ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Electron Beam ◽  
Photoelectron Spectroscopy ◽  
Surface Reactions ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
X Ray ◽  
Electron Beam Induced Deposition

Electron-induced surface reactions of (η5-C5H5)Fe(CO)2Mn(CO)5were exploredin situunder ultra-high vacuum conditions using X-ray photoelectron spectroscopy and mass spectrometry.

UHV Preparation and In-Situ Surface Analysis of MNFE/Nife Exchange Structures: Interfacial Impurity Incorporation

1993 ◽  
Vol 313 ◽  
Author(s):  
Susan L. Cohen ◽  
John M. Baker ◽  
Michael A. Russak ◽  
Gerald J. Scilla ◽  
Cherngye Hwang ◽  
...  
Keyword(s):  
Surface Analysis ◽  
Photoelectron Spectroscopy ◽  
Exchange Coupling ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Impurity Incorporation ◽  
X Ray ◽  
Manufacturing Applications ◽  
Analysis System

ABSTRACTMnFe/NiFe exchange structures have been prepared in an ultra-high vacuum sputtering/surface analysis system. Controlled introduction of residual gas impurities such as O2 and H2O at the MnFe/NiFe interface is studied by in-situ x-ray photoelectron spectroscopy (XPS) and the exchange structures are magnetically characterized. Due to the extreme reactivity of the NiFe surface towards O2, the exchange coupling is severely degraded by only small exposures of this molecule to the NiFe surface. In contrast, H2O does not oxidize the NiFe surface and therefore can be tolerated in greater quantities in the sputtering chamber without detrimental loss of exchange. This understanding of the basic surface chemistry of the MnFe and NiFe surfaces can lead to improved sputtering practices in actual manufacturing applications.

An ultra-high vacuum electrochemical flow cell for in situ/operando soft X-ray spectroscopy study

2014 ◽  
Vol 85 (4) ◽  
pp. 043106 ◽  
Author(s):  
Debajeet K. Bora ◽  
Per-Anders Glans ◽  
John Pepper ◽  
Yi-Sheng Liu ◽  
Chun Du ◽  
...  
Keyword(s):  
High Vacuum ◽  
Flow Cell ◽  
Ultra High Vacuum ◽  
Spectroscopy Study ◽  
X Ray ◽  
Electrochemical Flow Cell

XPS, AES and Leed Studies of The Interaction Between The Si(100) 2×1 Surface and Cadmium Deposited at Room Temperature

1995 ◽  
Vol 382 ◽  
Author(s):  
S. Santucci ◽  
S. Di Nardo ◽  
L. Lozzi ◽  
M. Passacantando ◽  
P. Picozzi
Keyword(s):  
Photoelectron Spectroscopy ◽  
Room Temperature ◽  
Thermal Evaporation ◽  
Early Stage ◽  
High Vacuum ◽  
Amorphous Structure ◽  
Ultra High Vacuum ◽  
Energy Position ◽  
X Ray

ABSTRACTVery thin films of cadmium, with a mean thickness between 1 Å and 500 Å, were deposited by thermal evaporation in ultra-high-vacuum on a Si(100) 2×1 surface held at room temperature. In situ X-ray Photoelectron Spectroscopy and Auger Electron Spectroscopy were performed in order to investigate the interaction between the silicon substrate and the deposited cadmium. In samples with deposited mean thickness up to 3 Å, cadmium and silicon are found to be strongly interacting. In fact both XPS and AES spectra show evident changes in shape and energy position leading to the conclusion that a chemical compound between Cd and Si is formed. No diffusion between cadmium and silicon is observed, so the cadmium atoms deposited after the first 3 Å show a bulk character. The analysis of the first derivative intensity of the Si L23VV and Cd M5N45N45 Auger signals, varying the amount of deposited Cd, indicates the formation of islands in the early stage of the Cd growth. These islands show an amorphous structure as observed by using the LEED spectroscopy.

Incorporation and Role of Nitrogen During Oxynitridation of Silicon Studied by Photoelectron Spectroscopy

1999 ◽  
Vol 567 ◽  
Author(s):  
Masayuki Suzuki ◽  
Yoji Saito
Keyword(s):  
Photoelectron Spectroscopy ◽  
High Vacuum ◽  
Oxide Films ◽  
Silicon Surfaces ◽  
Gaseous Mixtures ◽  
X Ray ◽  
Initial Stage ◽  
Thermal Stability Of

ABSTRACTWe tried direct oxynitridation of silicon surfaces by remote-plasma-exited nitrogen and oxygen gaseous mixtures at 700°C in a high vacuum. The oxynitrided surfaces were investigated with in-situ X-ray photoelectron spectroscopy. With increase of the oxynitridation time, the surface density of nitrogen gradually increases, but that of oxygen shows nearly saturation behavior after the rapid increase in the initial stage. We also annealed the grown oxynitride and oxide films to investigate the role of the contained nitrogen. The desorption rate of oxygen from the oxynitride films is much less than that from oxide films. We confirmed that nitrogen stabilizes the thermal stability of these oxynitride films.

scholarly journals An in situ near-ambient pressure X-ray Photoelectron Spectroscopy study of Mn polarised anodically in a cell with solid oxide electrolyte

2015 ◽  
Vol 174 ◽  
pp. 532-541 ◽  
Author(s):  
Benedetto Bozzini ◽  
Matteo Amati ◽  
Patrizia Bocchetta ◽  
Simone Dal Zilio ◽  
Axel Knop-Gericke ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Ambient Pressure ◽  
Solid Oxide ◽  
Spectroscopy Study ◽  
Solid Oxide Electrolyte ◽  
X Ray ◽  
A Cell ◽  
Oxide Electrolyte

Ultra-high vacuum chemical vapor deposition and in situ characterization of titanium oxide thin films

1991 ◽  
Vol 6 (9) ◽  
pp. 1913-1918 ◽  
Author(s):  
Jiong-Ping Lu ◽  
Rishi Raj
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Titanium Oxide ◽  
Vapor Deposition ◽  
Photoelectron Spectroscopy ◽  
High Vacuum ◽  
Chemical Vapor ◽  
Titanium Isopropoxide ◽  
Ultra High Vacuum

Chemical vapor deposition (CVD) of titanium oxide films has been performed for the first time under ultra-high vacuum (UHV) conditions. The films were deposited through the pyrolysis reaction of titanium isopropoxide, Ti(OPri)4, and in situ characterized by x-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES). A small amount of C incorporation was observed during the initial stages of deposition, through the interaction of precursor molecules with the bare Si substrate. Subsequent deposition produces pure and stoichiometric TiO2 films. Si–O bond formation was detected in the film-substrate interface. Deposition rate was found to increase with the substrate temperature. Ultra-high vacuum chemical vapor deposition (UHV-CVD) is especially useful to study the initial stages of the CVD processes, to prepare ultra-thin films, and to investigate the composition of deposited films without the interference from ambient impurities.

scholarly journals An in situ near-ambient pressure X-ray photoelectron spectroscopy study of CO 2 reduction at Cu in a SOE cell

2017 ◽  
Vol 799 ◽  
pp. 17-25 ◽  
Author(s):  
Benedetto Bozzini ◽  
Matteo Amati ◽  
Claudio Mele ◽  
Axel Knop-Gericke ◽  
Erik Vesselli
Keyword(s):  
Photoelectron Spectroscopy ◽  
Ambient Pressure ◽  
Spectroscopy Study ◽  
X Ray
Sign in / Sign up

Export Citation Format

Share Document