Spectroscopic reflectometry for characterization of Through Silicon Via profile of Bosch etching process

2019 ◽  
Vol 37 (6) ◽  
pp. 062205
Author(s):  
Joachim Bauer ◽  
Oksana Fursenko ◽  
Steffen Marschmeyer ◽  
Friedhelm Heinrich ◽  
Francesco Villasmunta ◽  
...  
Keyword(s):  
Etching Process ◽  
Through Silicon Via ◽  
Spectroscopic Reflectometry

Characterization of the CH4/H2/Ar high density plasma etching process for HgCdTe

1999 ◽  
Vol 28 (4) ◽  
pp. 347-354 ◽  
Author(s):  
C. R. Eddy ◽  
D. Leonhardt ◽  
V. A. Shamamian ◽  
J. R. Meyer ◽  
C. A. Hoffman ◽  
...  
Keyword(s):  
Plasma Etching ◽  
High Density ◽  
Etching Process ◽  
Plasma Etching Process ◽  
Density Plasma

Characterization of Wet Chemical Atomic Layer Etching of InGaAs

2021 ◽  
Vol 314 ◽  
pp. 95-98
Author(s):  
Tomoki Hirano ◽  
Kenya Nishio ◽  
Takashi Fukatani ◽  
Suguru Saito ◽  
Yoshiya Hagimoto ◽  
...  
Keyword(s):  
Surface Condition ◽  
Atomic Layer ◽  
Interface State ◽  
State Density ◽  
Interface State Density ◽  
Etching Process ◽  
Wet Chemical ◽  
Oxide Removal ◽  
Atomic Layer Etching

In this work, we characterized the wet chemical atomic layer etching of an InGaAs surface by using various surface analysis methods. For this etching process, H2O2 was used to create a self-limiting oxide layer. Oxide removal was studied for both HCl and NH4OH solutions. Less In oxide tended to remain after the HCl treatment than after the NH4OH treatment, so the combination of H2O2 and HCl is suitable for wet chemical atomic layer etching. In addition, we found that repetition of this etching process does not impact on the oxide amount, surface roughness, and interface state density. Thus, nanoscale etching of InGaAs with no impact on the surface condition is possible with this method.

Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films

2015 ◽  
Author(s):  
Miloslav Ohlídal ◽  
Ivan Ohlidal ◽  
David Nečas ◽  
Jiří Vodák ◽  
Daniel Franta ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Characterization ◽  
Spectroscopic Reflectometry
Sign in / Sign up

Export Citation Format

Share Document