Texture and phase variation of ALD PbTiO3 films crystallized by rapid thermal anneal

2019 ◽  
Vol 37 (2) ◽  
pp. 020917 ◽  
Author(s):  
Nicholas A. Strnad ◽  
Daniel M. Potrepka ◽  
Jeffrey S. Pulskamp ◽  
Yang Liu ◽  
Jacob L. Jones ◽  
...  
Keyword(s):  
Phase Variation ◽  
Rapid Thermal Anneal

TEM characterization of WSix films

1994 ◽  
Vol 52 ◽  
pp. 848-849
Author(s):  
V. C. Kannan ◽  
S. M. Merchant ◽  
R. B. Irwin ◽  
A. K. Nanda ◽  
M. Sundahl ◽  
...  
Keyword(s):  
Integrated Circuits ◽  
Vapor Deposition ◽  
High Purity ◽  
Physical Vapor Deposition ◽  
Thermal Treatments ◽  
Rapid Thermal Anneal ◽  
Tungsten Silicide ◽  
Tem Characterization ◽  
Metal Silicides

Metal silicides such as WSi2, MoSi2, TiSi2, TaSi2 and CoSi2 have received wide attention in recent years for semiconductor applications in integrated circuits. In this study, we describe the microstructures of WSix films deposited on SiO2 (oxide) and polysilicon (poly) surfaces on Si wafers afterdeposition and rapid thermal anneal (RTA) at several temperatures. The stoichiometry of WSix films was confirmed by Rutherford Backscattering Spectroscopy (RBS). A correlation between the observed microstructure and measured sheet resistance of the films was also obtained.WSix films were deposited by physical vapor deposition (PVD) using magnetron sputteringin a Varian 3180. A high purity tungsten silicide target with a Si:W ratio of 2.85 was used. Films deposited on oxide or poly substrates gave rise to a Si:W ratio of 2.65 as observed by RBS. To simulatethe thermal treatments of subsequent processing procedures, wafers with tungsten silicide films were subjected to RTA (AG Associates Heatpulse 4108) in a N2 ambient for 60 seconds at temperatures ranging from 700° to 1000°C.

Electrical Damage Due to Low Energy Plasma Processing of GaAs Structures

1991 ◽  
Vol 223 ◽  
Author(s):  
Hans P. Zappe ◽  
Gudrun Kaufel
Keyword(s):  
Chemical Processes ◽  
Low Energy ◽  
Electrical Behavior ◽  
Rapid Thermal Anneal ◽  
High Temperature Anneal ◽  
Significant Damage ◽  
Low Energies ◽  
Long Time ◽  
Physical Plasma

ABSTRACTThe effect of numerous plasma reative ion etch and physical milling processes on the electrical behavior of GaAs bulk substrates has been investigated by means of electric microwave absorption. It was seen that plasma treatments at quite low energies may significantly affect the electrical quality of the etched semiconductor. Predominantly physical plasma etchants (Ar) were seen to create significant damage at very low energies. Chemical processes (involving Cl or F), while somewhat less pernicious, also gave rise to electrical substrate damage, the effect greater for hydrogenic ambients. Whereas rapid thermal anneal treatments tend to worsen the electrical integrity, some substrates respond positively to long-time high temperature anneal steps.

scholarly journals Structure, Function, and Regulation of the Essential Virulence Factor Capsular Polysaccharide of Vibrio vulnificus

2020 ◽  
Vol 21 (9) ◽  
pp. 3259 ◽  
Author(s):  
Gregg S. Pettis ◽  
Aheli S. Mukerji
Keyword(s):  
Coastal Waters ◽  
Capsular Polysaccharide ◽  
Vibrio Vulnificus ◽  
Critical Role ◽  
Phase Variation ◽  
Innate Immune ◽  
Repeat Sequences ◽  
Life Threatening ◽  
Inflammatory Cytokine Response ◽  
Group 1

Vibrio vulnificus populates coastal waters around the world, where it exists freely or becomes concentrated in filter feeding mollusks. It also causes rapid and life-threatening sepsis and wound infections in humans. Of its many virulence factors, it is the V. vulnificus capsule, composed of capsular polysaccharide (CPS), that plays a critical role in evasion of the host innate immune system by conferring antiphagocytic ability and resistance to complement-mediated killing. CPS may also provoke a portion of the host inflammatory cytokine response to this bacterium. CPS production is biochemically and genetically diverse among strains of V. vulnificus, and the carbohydrate diversity of CPS is likely affected by horizontal gene transfer events that result in new combinations of biosynthetic genes. Phase variation between virulent encapsulated opaque colonial variants and attenuated translucent colonial variants, which have little or no CPS, is a common phenotype among strains of this species. One mechanism for generating acapsular variants likely involves homologous recombination between repeat sequences flanking the wzb phosphatase gene within the Group 1 CPS biosynthetic and transport operon. A considerable number of environmental, genetic, and regulatory factors have now been identified that affect CPS gene expression and CPS production in this pathogen.

scholarly journals Stereo-DIC Measurements of a Vibrating Bladed Disk: In-Depth Analysis of Full-Field Deformed Shapes

2021 ◽  
Vol 11 (12) ◽  
pp. 5430
Author(s):  
Paolo Neri ◽  
Alessandro Paoli ◽  
Ciro Santus
Keyword(s):  
Single Point ◽  
Excitation Frequency ◽  
Phase Variation ◽  
Operating Conditions ◽  
Image Correlation ◽  
Response Analysis ◽  
Full Field ◽  
Low Speed ◽  
Bladed Disk ◽  
Depth Analysis

Vibration measurements of turbomachinery components are of utmost importance to characterize the dynamic behavior of rotating machines, thus preventing undesired operating conditions. Local techniques such as strain gauges or laser Doppler vibrometers are usually adopted to collect vibration data. However, these approaches provide single-point and generally 1D measurements. The present work proposes an optical technique, which uses two low-speed cameras, a multimedia projector, and three-dimensional digital image correlation (3D-DIC) to provide full-field measurements of a bladed disk undergoing harmonic response analysis (i.e., pure sinusoidal excitation) in the kHz range. The proposed approach exploits a downsampling strategy to overcome the limitations introduced by low-speed cameras. The developed experimental setup was used to measure the response of a bladed disk subjected to an excitation frequency above 6 kHz, providing a deep insight in the deformed shapes, in terms of amplitude and phase distributions, which could not be feasible with single-point sensors. Results demonstrated the system’s effectiveness in measuring amplitudes of few microns, also evidencing blade mistuning effects. A deeper insight into the deformed shape analysis was provided by considering the phase maps on the entire blisk geometry, and phase variation lines were observed on the blades for high excitation frequency.

Phase Variation of Amorphous-Si and Poly-Si Thin Films with Excimer Laser Irradiation

1996 ◽  
Vol 35 (Part 2, No. 11B) ◽  
pp. L1473-L1475 ◽  
Author(s):  
Kuninori Kitahara ◽  
Katsuyuki Suga ◽  
Akito Hara ◽  
Kazuo Nakajima
Keyword(s):  
Thin Films ◽  
Laser Irradiation ◽  
Excimer Laser ◽  
Phase Variation ◽  
Excimer Laser Irradiation ◽  
Amorphous Si
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