Revisitation of the structure zone model based on the investigation of the structure and properties of Ti, Zr, and Hf thin films deposited at 70–600 °C using DC magnetron sputtering

2018 ◽  
Vol 36 (4) ◽  
pp. 041506 ◽  
Author(s):  
Eiji Kusano
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Zone Model ◽  
Structure And Properties ◽  
Dc Magnetron Sputtering ◽  
Model Based

scholarly journals Unraveling the Structure and Properties of Layered and Mixed ReO3–WO3 Thin Films Deposited by Reactive DC Magnetron Sputtering

ACS Omega ◽  
2022 ◽  
Author(s):  
Boris Polyakov ◽  
Edgars Butanovs ◽  
Andrejs Ogurcovs ◽  
Anatolijs Sarakovskis ◽  
Martins Zubkins ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Structure And Properties ◽  
Dc Magnetron Sputtering ◽  
Wo3 Thin Films

Structure and Properties of W-Ti Thin Films Deposited by Magnetron Sputtering

2016 ◽  
Vol 849 ◽  
pp. 654-658
Author(s):  
Guo Qi Sun ◽  
Sun Yong ◽  
Yong Hua Duan
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Sheet Resistance ◽  
Silicon Substrates ◽  
Structure And Properties ◽  
Dc Magnetron Sputtering ◽  
Polycrystalline Structure ◽  
Columnar Grains ◽  
P Type ◽  
Ti Content

W-Ti thin films with different Ti contents were prepared by dc magnetron sputtering on silicon substrates of p-type (100) orientation, and the pure W and pure Ti thin films with the same thick were also prepared for comparison. The microstructure and properties of W-Ti thin film were characterized by XRD, SEM, AFM, microhardness tester and four-point probe method. The results show that the thin films exhibited a polycrystalline structure in the form of columnar grains, and only b.c.c. W phase could be registered in the films, and with the increase of Ti content, the solid solution of W-Ti was found. Compared to pure W film, the microhardness of W-Ti films decreased with the increasing of Ti content, while the sheet resistance rises with the increasing of Ti content. The microhardness of W-Ti thin films was higher than pure Ti thin films, and the sheet resistance was lower than pure Ti thin films.

Preparing transparent cobalt-doped ZnO thin films by DC magnetron sputtering

2017 ◽  
Vol 4 (5) ◽  
pp. 6311-6316 ◽  
Author(s):  
Pongladda Panyajirawut ◽  
Nattha Pratumsuwan ◽  
Kornkamon Meesombad ◽  
Kridsana Thanawattana ◽  
Artit Chingsungnoen ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Zno Thin Films ◽  
Dc Magnetron Sputtering ◽  
Doped Zno

Characterization of Ti–Zr–V thin films deposited by DC and unipolar pulsed DC magnetron sputtering

Vacuum ◽  
2021 ◽  
Vol 188 ◽  
pp. 110200
Author(s):  
Sihui Wang ◽  
Wei Wei ◽  
Yonghao Gao ◽  
Haibin Pan ◽  
Yong Wang
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

The influence of pressure and magnetic field on the deposition of epitaxial TiBx thin films from DC magnetron sputtering

Vacuum ◽  
2020 ◽  
Vol 177 ◽  
pp. 109355
Author(s):  
Nils Nedfors ◽  
Daniel Primetzhofer ◽  
Igor Zhirkov ◽  
Justinas Palisaitis ◽  
Per O.Å. Persson ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering

On‐axis dc magnetron sputtering of large area high quality YBa2Cu3O7superconducting thin films

1992 ◽  
Vol 61 (3) ◽  
pp. 348-350 ◽  
Author(s):  
Y. Z. Zhang ◽  
L. Li ◽  
Y. Y. Zhao ◽  
B. R. Zhao ◽  
J. W. Li ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Large Area ◽  
High Quality
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