Maghemite thin films prepared using atmospheric-pressure plasma annealing

2018 ◽  
Vol 36 (4) ◽  
pp. 04F405
Author(s):  
Hong-Ying Chen ◽  
Shun-Hsiang Yang
Coatings ◽  
2019 ◽  
Vol 9 (6) ◽  
pp. 357 ◽  
Author(s):  
Yu Xu ◽  
Yu Zhang ◽  
Tao He ◽  
Ke Ding ◽  
Xiaojiang Huang ◽  
...  

Amorphous TiO2 thin films were respectively annealed by 13.56 MHz radio frequency (RF) atmospheric pressure plasma at discharge powers of 40, 60, 80 W and thermal treatment at its corresponding substrate temperature (Ts). Ts was estimated through three measurement methods (thermocouple, Newton’s law of cooling and OH optical emission spectra simulation) and showed identically close results of 196, 264 and 322 °C, respectively. Comparing with thermal annealing, this RF atmospheric pressure plasma annealing process has obvious effects in improving crystallization of the amorphous films, based on the XRD and Raman analysis of the film. Amorphous TiO2 film can be changed to anatase film at about 264 °C of Ts for 30 min plasma treatment, while it almost remains amorphous after 322 °C thermal treatment for the same time.


2014 ◽  
Vol 314 ◽  
pp. 1074-1081 ◽  
Author(s):  
Jia-Yang Juang ◽  
Tung-Sheng Chou ◽  
Hsin-Tien Lin ◽  
Yuan-Fang Chou ◽  
Chih-Chiang Weng

2020 ◽  
Vol 404 ◽  
pp. 126498
Author(s):  
Ming Gao ◽  
Yu Wang ◽  
Yongliang Zhang ◽  
Ying Li ◽  
Yao Tang ◽  
...  

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