scholarly journals Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography

2017 ◽  
Vol 35 (6) ◽  
pp. 061603 ◽  
Author(s):  
Roberto Fallica ◽  
Dimitrios Kazazis ◽  
Robert Kirchner ◽  
Anja Voigt ◽  
Iacopo Mochi ◽  
...  
Keyword(s):  
Electron Beam ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography

Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair

2014 ◽  
Vol 117 (4) ◽  
pp. 1705-1713 ◽  
Author(s):  
J. H. Noh ◽  
M. G. Stanford ◽  
B. B. Lewis ◽  
J. D. Fowlkes ◽  
H. Plank ◽  
...  
Keyword(s):  
Electron Beam ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Electron Beam Induced Deposition

scholarly journals Estimation of resist sensitivity for extreme ultraviolet lithography using an electron beam

AIP Advances ◽  
2016 ◽  
Vol 6 (8) ◽  
pp. 085210 ◽  
Author(s):  
Tomoko Gowa Oyama ◽  
Akihiro Oshima ◽  
Seiichi Tagawa
Keyword(s):  
Electron Beam ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography

Application of natural linear polysaccharide to green resist polymers for electron beam and extreme-ultraviolet lithography

2014 ◽  
Vol 53 (11) ◽  
pp. 116505 ◽  
Author(s):  
Satoshi Takei ◽  
Akihiro Oshima ◽  
Tomoko G. Oyama ◽  
Kenta Ito ◽  
Kigen Sugahara ◽  
...  
Keyword(s):  
Electron Beam ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography

scholarly journals Multi-trigger resist for electron beam and extreme ultraviolet lithography

2018 ◽  
Author(s):  
Dimitrios Kazazis ◽  
Yasin Ekinci ◽  
Wolfgang Theis ◽  
Alex P. Robinson ◽  
Carmen Popescu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography

Backbone Degradable Poly(aryl acetal) Photoresist Polymers: Synthesis, Acid Sensitivity, and Extreme Ultraviolet Lithography Performance

2019 ◽  
Vol 52 (3) ◽  
pp. 886-895 ◽  
Author(s):  
Matthias S. Ober ◽  
Duane R. Romer ◽  
John Etienne ◽  
P. J. Thomas ◽  
Vipul Jain ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Acid Sensitivity

Demonstration of phase-shift masks for extreme-ultraviolet lithography

2006 ◽  
Author(s):  
Bruno La Fontaine ◽  
Adam R. Pawloski ◽  
Obert Wood ◽  
Yunfei Deng ◽  
Harry J. Levinson ◽  
...  
Keyword(s):  
Phase Shift ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography
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