Plasma enhanced atomic layer deposition of Al2O3gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
2017 ◽
Vol 35
(1)
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pp. 01B140
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2019 ◽
Vol 35
(7)
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pp. 720-731
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2018 ◽
Vol 44
(2)
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pp. 1556-1565
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2021 ◽
Vol 10
(2)
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pp. 023001
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2006 ◽
Vol 17
(2-4)
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pp. 145-149
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2010 ◽
Vol 207
(9)
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pp. 2185-2189
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2012 ◽
Vol 30
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pp. 01A150
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