Analytic estimation and minimization of line edge roughness in electron-beam lithography

Rui Guo; Soo-Young Lee; Jin Choi; Sung-Hoon Park; In-Kyun Shin; Chan-Uk Jeon

doi:10.1116/1.4936070

Analytic estimation and minimization of line edge roughness in electron-beam lithography

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.4936070 ◽

2015 ◽

Vol 33 (6) ◽

pp. 06FD07 ◽

Cited By ~ 1

Author(s):

Rui Guo ◽

Soo-Young Lee ◽

Jin Choi ◽

Sung-Hoon Park ◽

In-Kyun Shin ◽

...

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Line Edge Roughness ◽

Edge Roughness ◽

Analytic Estimation

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Analytic estimation of line edge roughness for large-scale uniform patterns in electron-beam lithography

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.4968186 ◽

2016 ◽

Vol 34 (6) ◽

pp. 06K605 ◽

Cited By ~ 1

Author(s):

Rui Guo ◽

Soo-Young Lee ◽

Jin Choi ◽

Seom-Beom Kim ◽

Sung-Hoon Park ◽

...

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Large Scale ◽

Line Edge Roughness ◽

Edge Roughness ◽

Analytic Estimation

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Analysis of mitigating factors for line edge roughness generated during electron beam lithography using machine learning

Japanese Journal of Applied Physics ◽

10.35848/1347-4065/ac0d13 ◽

2021 ◽

Author(s):

Yuqing Jin ◽

Takahiro KOZAWA ◽

Takao Tamura

Keyword(s):

Machine Learning ◽

Electron Beam ◽

Electron Beam Lithography ◽

Line Edge Roughness ◽

Edge Roughness ◽

Mitigating Factors

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A study of line edge roughness in chemically amplified resist for low energy electron-beam lithography

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) ◽

10.1109/imnc.2001.984209 ◽

2002 ◽

Author(s):

T. Nakasugi ◽

A. Ando ◽

R. Inanami ◽

N. Sasaki ◽

K. Sugihara

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Low Energy ◽

Energy Electron ◽

Line Edge Roughness ◽

Chemically Amplified ◽

Edge Roughness ◽

Chemically Amplified Resist ◽

Low Energy Electron

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Impact of Latent Image Quality on Line Edge Roughness in Electron Beam Lithography

Japanese Journal of Applied Physics ◽

10.1143/jjap.43.3739 ◽

2004 ◽

Vol 43 (6B) ◽

pp. 3739-3743 ◽

Cited By ~ 5

Author(s):

Masaki Yoshizawa ◽

Shigeru Moriya ◽

Hiroyuki Nakano ◽

Yuichi Shirai ◽

Tatsuo Morita ◽

...

Keyword(s):

Electron Beam ◽

Image Quality ◽

Electron Beam Lithography ◽

Line Edge Roughness ◽

Latent Image ◽

Edge Roughness ◽

On Line

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Simulation of amine concentration dependence on line edge roughness after development in electron beam lithography

Journal of Applied Physics ◽

10.1063/1.2952046 ◽

2008 ◽

Vol 104 (2) ◽

pp. 024303 ◽

Cited By ~ 4

Author(s):

Akinori Saeki ◽

Takahiro Kozawa ◽

Seiichi Tagawa ◽

Heidi B. Cao ◽

Hai Deng ◽

...

Keyword(s):

Electron Beam ◽

Concentration Dependence ◽

Electron Beam Lithography ◽

Line Edge Roughness ◽

Amine Concentration ◽

Edge Roughness ◽

On Line

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The impact of latent image quality on line edge roughness in electron beam lithography

Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference ◽

10.1109/imnc.2003.1268599 ◽

2004 ◽

Author(s):

M. Yoshizawa ◽

S. Moriya ◽

H. Nakano ◽

T. Morita ◽

T. Kitagawa ◽

...

Keyword(s):

Electron Beam ◽

Image Quality ◽

Electron Beam Lithography ◽

Line Edge Roughness ◽

Latent Image ◽

Edge Roughness ◽

On Line ◽

The Impact

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Theoretical study on effects of exposure pattern width on line edge roughness and stochastic defect generation in fabrication of 16-nm-half-pitch line-and-space patterns by electron beam lithography

Japanese Journal of Applied Physics ◽

10.7567/jjap.56.116501 ◽

2017 ◽

Vol 56 (11) ◽

pp. 116501

Author(s):

Takahiro Kozawa ◽

Takao Tamura

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Theoretical Study ◽

Line Edge Roughness ◽

Defect Generation ◽

Edge Roughness ◽

On Line ◽

Exposure Pattern ◽

Pattern Width

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Minimization of line edge roughness and critical dimension error in electron-beam lithography

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.4899238 ◽

2014 ◽

Vol 32 (6) ◽

pp. 06F505 ◽

Cited By ~ 6

Author(s):

Xinyu Zhao ◽

Soo-Young Lee ◽

Jin Choi ◽

Sang-Hee Lee ◽

In-Kyun Shin ◽

...

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Critical Dimension ◽

Line Edge Roughness ◽

Edge Roughness

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Motif Parameters Based Characterization of Line Edge Roughness of a Nanoscale Grating Structure

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.437.45 ◽

2010 ◽

Vol 437 ◽

pp. 45-50

Author(s):

Zhuang De Jiang ◽

Feng Xia Zhao ◽

Wei Xuan Jing ◽

Philip D. Prewett ◽

Kyle Jiang

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Evaluation Method ◽

Line Edge Roughness ◽

Grating Structure ◽

Nano Scale ◽

Edge Roughness ◽

Positive Resist

Motif parameters were introduced to characterize line edge roughness (LER) of a nanoscale grating structure. Firstly with electron beam lithography employed the expected nano-scale grating structure with linewidth of 16 nm was fabricated on positive resist. Then the line edge profiles of the structure were extracted and their LERs were characterized. The results showed that the evaluation method is rather simple, effective and recommendable.

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