Determination of the number density of excited and ground Zn atoms during rf magnetron sputtering of ZnO target

2015 ◽  
Vol 33 (4) ◽  
pp. 041302 ◽  
Author(s):  
L. Maaloul ◽  
R. K. Gangwar ◽  
L. Stafford
Keyword(s):  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Number Density

scholarly journals Determination of the density of the defect states in Hf0.5Zr0.5O2 high-k film Deposited by using rf-magnetron sputtering technique

AIP Advances ◽  
2014 ◽  
Vol 4 (8) ◽  
pp. 087114 ◽  
Author(s):  
W. Lu ◽  
J. X. Lu ◽  
X. Ou ◽  
X. J. Liu ◽  
Y. Q. Cao ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Defect States ◽  
High K

Spectroscopic ellipsometric determination of optical properties of V-Al co-doped ZnO films by rf magnetron sputtering

2013 ◽  
Vol 30 (4) ◽  
pp. 221-227 ◽  
Author(s):  
A. Sayari ◽  
L. El Mir ◽  
S. Al-Heniti ◽  
E. Shalaan ◽  
S. J. Yaghmour ◽  
...  
Keyword(s):  
Optical Properties ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Zno Films ◽  
Doped Zno ◽  
Co Doped

Direct Synthesis of Isolated L10-FePtCu Nanoparticles by RF-Magnetron Sputtering

2007 ◽  
Vol 127 ◽  
pp. 129-134 ◽  
Author(s):  
Han Wool Ryu ◽  
Kazuhisa Sato ◽  
Yoshihiko Hirotsu
Keyword(s):  
Particle Size ◽  
Magnetron Sputtering ◽  
Alloy Composition ◽  
Direct Synthesis ◽  
Thermal Fluctuation ◽  
Rf Magnetron Sputtering ◽  
Number Density ◽  
Composition Distribution ◽  
X Ray ◽  
Post Deposition

Isolated and oriented hard magnetic FePtCu ternary alloy nanoparticles with the L10-type ordered structure have been directly fabricated by rf-magnetron sputtering onto NaCl substrate kept at 613K without any post-deposition annealing. Structure and morphology of those particles were studied by TEM. When the sputtering duration decreases, the particle size decreases and the particle areal number density increases. These nanoparticles have <100> orientation on the NaCl substrate. Alloy composition distribution from particle to particle examined by nano-beam elemental x-ray analysis was found to be quite small, which can be attributed to the homogeneous structure formed by co-deposition of Fe, Pt and Cu by sputtering. Thermal fluctuation of the magnetization becomes prominent in the specimen with the particle size smaller than about 10nm in diameter.

Single Crystal, High Band Gap CdS Thin Films Grown by RF Magnetron Sputtering in Argon Atmosphere for Solar Cell Applications

2018 ◽  
Vol 10 (3) ◽  
pp. 03005-1-03005-6 ◽  
Author(s):  
Rupali Kulkarni ◽  
◽  
Amit Pawbake ◽  
Ravindra Waykar ◽  
Ashok Jadhawar ◽  
...  
Keyword(s):  
Thin Films ◽  
Solar Cell ◽  
Magnetron Sputtering ◽  
Single Crystal ◽  
Band Gap ◽  
Rf Magnetron Sputtering ◽  
Argon Atmosphere ◽  
Cds Thin Films ◽  
High Band
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