Resolution and alignment accuracy of low-temperature in situ electron beam lithography for nanophotonic device fabrication

2015 ◽  
Vol 33 (2) ◽  
pp. 021603 ◽  
Author(s):  
Manuel Gschrey ◽  
Ronny Schmidt ◽  
Jan-Hindrik Schulze ◽  
André Strittmatter ◽  
Sven Rodt ◽  
...  
Keyword(s):  
Electron Beam ◽  
Low Temperature ◽  
Electron Beam Lithography ◽  
Device Fabrication ◽  
Alignment Accuracy ◽  
Nanophotonic Device

scholarly journals Advanced in-situ electron-beam lithography for deterministic nanophotonic device processing

2015 ◽  
Vol 86 (7) ◽  
pp. 073903 ◽  
Author(s):  
Arsenty Kaganskiy ◽  
Manuel Gschrey ◽  
Alexander Schlehahn ◽  
Ronny Schmidt ◽  
Jan-Hindrik Schulze ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Device Processing ◽  
Nanophotonic Device

Sub-10-nm Overlay Accuracy in Electron Beam Lithography for Nanometer-Scale Device Fabrication

1998 ◽  
Vol 37 (Part 1, No. 12B) ◽  
pp. 6788-6791 ◽  
Author(s):  
Kenji Yamazaki ◽  
Akira Fujiwara ◽  
Yasuo Takahashi ◽  
Hideo Namatsu ◽  
Kenji Kurihara
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Device Fabrication ◽  
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scholarly journals Three-Dimensional in Situ Electron-Beam Lithography Using Water Ice

Nano Letters ◽  
2018 ◽  
Vol 18 (8) ◽  
pp. 5036-5041 ◽  
Author(s):  
Yu Hong ◽  
Ding Zhao ◽  
Dongli Liu ◽  
Binze Ma ◽  
Guangnan Yao ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Three Dimensional ◽  
Water Ice

In situ patterning of organic molecules in aqueous solutions using an inverted electron-beam lithography system

2016 ◽  
Vol 55 (6S1) ◽  
pp. 06GL07 ◽  
Author(s):  
Hiroki Miyazako ◽  
Kazuhiko Ishihara ◽  
Kunihiko Mabuchi ◽  
Takayuki Hoshino
Keyword(s):  
Electron Beam ◽  
Aqueous Solutions ◽  
Electron Beam Lithography ◽  
Organic Molecules ◽  
Lithography System
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