Impact of postdeposition annealing upon film properties of atomic layer deposition-grown Al2O3 on GaN

2015 ◽  
Vol 33 (1) ◽  
pp. 01A106 ◽  
Author(s):  
Annett Winzer ◽  
Nadine Szabó ◽  
Andre Wachowiak ◽  
Paul Matthias Jordan ◽  
Johannes Heitmann ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Film Properties ◽  
Layer Deposition

Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition

2018 ◽  
Vol 36 (2) ◽  
pp. 021515 ◽  
Author(s):  
Shinya Iwashita ◽  
Tsuyoshi Moriya ◽  
Takamichi Kikuchi ◽  
Munehito Kagaya ◽  
Naotaka Noro ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Film Properties ◽  
Layer Deposition ◽  
Ion Energies ◽  
Titanium Dioxides

scholarly journals Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method

AIP Advances ◽  
2019 ◽  
Vol 9 (3) ◽  
pp. 035333 ◽  
Author(s):  
Heungseop Song ◽  
Donghyuk Shin ◽  
Ji-eun Jeong ◽  
Heungsoo Park ◽  
Dae-Hong Ko
Keyword(s):  
Titanium Dioxide ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Growth Behavior ◽  
Film Properties ◽  
Feeding Method ◽  
Layer Deposition

Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition

2011 ◽  
Vol 158 (8) ◽  
pp. G169 ◽  
Author(s):  
Woo-Hee Kim ◽  
Min-Kyu Kim ◽  
W. J. Maeng ◽  
Julien Gatineau ◽  
Venkat Pallem ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Cerium Dioxide ◽  
Atomic Layer ◽  
Growth Characteristics ◽  
Film Properties ◽  
Layer Deposition

scholarly journals Guidance of growth mode and structural character in organic–inorganic hybrid materials – a comparative study

2014 ◽  
Vol 43 (9) ◽  
pp. 3492-3500 ◽  
Author(s):  
K. B. Klepper ◽  
O. Nilsen ◽  
S. Francis ◽  
H. Fjellvåg
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Comparative Study ◽  
Hybrid Materials ◽  
Atomic Layer ◽  
Organic Ligands ◽  
Film Properties ◽  
Inorganic Hybrid ◽  
Layer Deposition ◽  
Hybrid Thin Films

We investigated the influence of the functionality of organic ligands on film properties in organic–inorganic hybrid thin films deposited by atomic layer deposition.

Improvement of the photocatalytic degradation property of atomic layer deposited ZnO thin films: the interplay between film properties and functional performances

2015 ◽  
Vol 3 (21) ◽  
pp. 11453-11461 ◽  
Author(s):  
V. Rogé ◽  
N. Bahlawane ◽  
G. Lamblin ◽  
I. Fechete ◽  
F. Garin ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Photocatalytic Degradation ◽  
Atomic Layer ◽  
Photocatalytic Properties ◽  
Zno Thin Films ◽  
Film Properties ◽  
Layer Deposition ◽  
The Impact

In this work, we have evidenced the impact of stoichiometry on the photocatalytic properties of ZnO nanofilms grown by atomic layer deposition (ALD).

scholarly journals Understanding the role of rf-power on AlN film properties in hollow-cathode plasma-assisted atomic layer deposition

2020 ◽  
Vol 38 (2) ◽  
pp. 022405 ◽  
Author(s):  
Saidjafarzoda Ilhom ◽  
Deepa Shukla ◽  
Adnan Mohammad ◽  
John Grasso ◽  
Brian Willis ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Hollow Cathode ◽  
Atomic Layer ◽  
Rf Power ◽  
Cathode Plasma ◽  
Film Properties ◽  
Layer Deposition ◽  
Aln Film

scholarly journals Investigation on Transparent, Conductive ZnO:Al Films Deposited by Atomic Layer Deposition Process

Nanomaterials ◽  
2022 ◽  
Vol 12 (1) ◽  
pp. 172
Author(s):  
Kai Zhao ◽  
Jingye Xie ◽  
Yudi Zhao ◽  
Dedong Han ◽  
Yi Wang ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
High Performance ◽  
Atomic Layer ◽  
Deposition Process ◽  
Transparent Electrodes ◽  
Al Doping ◽  
Film Properties ◽  
Layer Deposition ◽  
System Method ◽  
Current Conduction

Transparent electrodes are a core component for transparent electron devices, photoelectric devices, and advanced displays. In this work, we fabricate fully-transparent, highly-conductive Al-doped ZnO (AZO) films using an atomic layer deposition (ALD) system method of repeatedly stacking ZnO and Al2O3 layers. The influences of Al cycle ratio (0, 2, 3, and 4%) on optical property, conductivity, crystallinity, surface morphology, and material components of the AZO films are examined, and current conduction mechanisms of the AZO films are analyzed. We found that Al doping increases electron concentration and optical bandgap width, allowing the AZO films to excellently combine low resistivity with high transmittance. Besides, Al doping induces preferred-growth-orientation transition from (002) to (100), which improves surface property and enhances current conduction across the AZO films. Interestingly, the AZO films with an Al cycle ratio of 3% show preferable film properties. Transparent ZnO thin film transistors (TFTs) with AZO electrodes are fabricated, and the ZnO TFTs exhibit superior transparency and high performance. This work accelerates the practical application of the ALD process in fabricating transparent electrodes.

scholarly journals Impact of precursor exposure on process efficiency and film properties in spatial atomic layer deposition

2021 ◽  
Vol 403 ◽  
pp. 126234
Author(s):  
Viet Huong Nguyen ◽  
Abderrahime Sekkat ◽  
Carmen Jiménez ◽  
Delfina Muñoz ◽  
Daniel Bellet ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Process Efficiency ◽  
Film Properties ◽  
Layer Deposition
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