Roughness evolution during the atomic layer deposition of metal oxides

2013 ◽  
Vol 31 (6) ◽  
pp. 061501 ◽  
Author(s):  
Peter Antony Premkumar ◽  
Annelies Delabie ◽  
Leonard N. J. Rodriguez ◽  
Alain Moussa ◽  
Christoph Adelmann
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Atomic Layer ◽  
Layer Deposition

Interface Studies of Metal Oxides Grown Directly on Hybrid Perovskite by Atomic Layer Deposition

2019 ◽  
Author(s):  
Claire Burgess ◽  
Farzad Mardekatani Asl ◽  
Valerio Zardetto ◽  
Herbert Lifka ◽  
Sjoerd Veenstra ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Atomic Layer ◽  
Hybrid Perovskite ◽  
Layer Deposition

Chemical resistance of thin film materials based on metal oxides grown by atomic layer deposition

2013 ◽  
Vol 542 ◽  
pp. 219-224 ◽  
Author(s):  
Väino Sammelselg ◽  
Ivan Netšipailo ◽  
Aleks Aidla ◽  
Aivar Tarre ◽  
Lauri Aarik ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Chemical Resistance ◽  
Atomic Layer ◽  
Layer Deposition

Atomic Layer Deposition for Improved Stability of Catalysts for the Conversion of Biomass to Chemicals and Fuels

2011 ◽  
Vol 1366 ◽  
Author(s):  
Monika K. Wiedmann ◽  
Yomaira J. Pagan-Torres ◽  
Mark H. Tucker ◽  
James A. Dumesic ◽  
T. F. Kuech
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Rate Constant ◽  
Flow Reactor ◽  
Atomic Layer ◽  
Deactivation Rate ◽  
Layer Deposition ◽  
Improved Stability ◽  
Deactivation Rate Constant ◽  
Acid Catalyzed

ABSTRACTAtomic layer deposition (ALD) has been used to coat SBA-15 and functionalized SBA-15 with various metal oxides. Use of SBA-15 coated with 4-10 ALD cycles of titania, alumina, niobia, or zirconia in the acid-catalyzed dehydration of fructose to 5-hydroxymethylfurfural (HMF) resulted in 24-57% conversion, with 0-22% selectivity, at 130 °C with 2 wt % fructose in 4:1 THF:H2O. Propylsulfonic acid functionalized SBA-15 (SBA-15-PrSO3H) had a 25% conversion and 48% selectivity for HMF under the same conditions. SBA-15-PrSO3H was also coated with 2 ALD cycles of titania followed by 8 ALD cycles silica. The deactivation rate constant for SBA-15-PrSO3H was 2.7 x 10-2 h-1 for the dehydration of fructose to HMF in a flow reactor at 130 °C with a feed of 2 wt % fructose in 4:1 THF:H2O. In comparison, the deactivation rate constant for the ALD coated SBA-15-PrSO3H-ALD was 7.9 x 10-3 h-1.

Direct patterning of metal oxides by hard templates and atomic layer deposition

2013 ◽  
Vol 10 (8/9) ◽  
pp. 692 ◽  
Author(s):  
Hyunchul Kim ◽  
Changdeuck Bae ◽  
Hyun Suk Jung ◽  
Jang Sik Lee ◽  
Hyunjung Shin
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Atomic Layer ◽  
Direct Patterning ◽  
Layer Deposition

scholarly journals Graphite Felt Modified by Atomic Layer Deposition with TiO2 Nanocoating Exhibits Super-Hydrophilicity, Low Charge-Transform Resistance, and High Electrochemical Activity

Nanomaterials ◽  
2020 ◽  
Vol 10 (9) ◽  
pp. 1710
Author(s):  
Wen-Jen Lee ◽  
Yu-Ting Wu ◽  
Yi-Wei Liao ◽  
Yen-Ting Liu
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Atomic Layer ◽  
Electrochemical Activity ◽  
Equivalent Series Resistance ◽  
Transfer Resistance ◽  
Graphite Felt ◽  
Layer Deposition ◽  
Starting Point ◽  
Low Charge

Graphite felt (GF) is a multi-functional material and is widely used as electrodes of electrochemical devices for energy and environmental applications. However, due to the inherent hydrophobicity of graphite felt, it must be hydrophilically pretreated to obtain good electrochemical activity. Metal oxides coating is one of the feasible methods to modify the surface of GF, and in order to ensure that the metal oxides have a better conductivity for obtaining higher electrochemical activity, a subsequent H2 heat-treatment process is usually adopted. In this study, atomic layer deposition (ALD) is used to deposit TiO2 nanocoating on graphite felt (GF) for surface modification without any H2 thermal post-treatment. The results show that the ALD-TiO2-modified GF (ALD-TiO2/GF) owns excellent hydrophilicity. Moreover, the ALD-TiO2/GF exhibits excellent electrochemical properties of low equivalent series resistance (Rs), low charge-transfer resistance (Rct), and high electrochemical activity. It demonstrates that ALD is an applicable technique for modifying the GF surface. In addition, it can be reasonably imagined that not only TiO2 film can effectively modify the GF surface, but also other metal oxides grown by ALD with nanoscale-thickness can also obtain the same benefits. We anticipate this work to be a starting point for modifying GF surface by using ALD with metal oxides nanocoating.

scholarly journals Selective-Area, Water-Free Atomic Layer Deposition of Metal Oxides on Graphene Defects

2021 ◽  
Author(s):  
Michael F. Mazza ◽  
Miguel Cabán-Acevedo ◽  
Harold J. Fu ◽  
Madeline C. Meier ◽  
Annelise C. Thompson ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Atomic Layer ◽  
Selective Area ◽  
Layer Deposition

Passivation of Defects in Macroscopic Graphene Sheets Via Selective Atomic Layer Deposition of Metal Oxides

2020 ◽  
Vol MA2020-01 (10) ◽  
pp. 834-834
Author(s):  
Michael F. Mazza ◽  
Annelise C. Thompson ◽  
Miguel Cabán-Acevedo ◽  
Nathan S Lewis
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Atomic Layer ◽  
Graphene Sheets ◽  
Layer Deposition
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