Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment

2012 ◽  
Vol 30 (1) ◽  
pp. 01A137 ◽  
Author(s):  
E. Steven Brandt ◽  
Jeremy M. Grace
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Atomic Layer ◽  
Polymer Substrates ◽  
Layer Deposition ◽  
Plasma Pretreatment

Interface Studies of Metal Oxides Grown Directly on Hybrid Perovskite by Atomic Layer Deposition

2019 ◽  
Author(s):  
Claire Burgess ◽  
Farzad Mardekatani Asl ◽  
Valerio Zardetto ◽  
Herbert Lifka ◽  
Sjoerd Veenstra ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Atomic Layer ◽  
Hybrid Perovskite ◽  
Layer Deposition

Chemical resistance of thin film materials based on metal oxides grown by atomic layer deposition

2013 ◽  
Vol 542 ◽  
pp. 219-224 ◽  
Author(s):  
Väino Sammelselg ◽  
Ivan Netšipailo ◽  
Aleks Aidla ◽  
Aivar Tarre ◽  
Lauri Aarik ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Chemical Resistance ◽  
Atomic Layer ◽  
Layer Deposition

Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment

2016 ◽  
Vol 3 (21) ◽  
pp. 1600340 ◽  
Author(s):  
Suk Won Park ◽  
Kiho Bae ◽  
Jun Woo Kim ◽  
Gyeong Beom Lee ◽  
Byoung-Ho Choi ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Oxygen Plasma ◽  
Atomic Layer ◽  
Chemical Protection ◽  
Layer Deposition ◽  
Plasma Pretreatment

Atomic Layer Deposition for Improved Stability of Catalysts for the Conversion of Biomass to Chemicals and Fuels

2011 ◽  
Vol 1366 ◽  
Author(s):  
Monika K. Wiedmann ◽  
Yomaira J. Pagan-Torres ◽  
Mark H. Tucker ◽  
James A. Dumesic ◽  
T. F. Kuech
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Rate Constant ◽  
Flow Reactor ◽  
Atomic Layer ◽  
Deactivation Rate ◽  
Layer Deposition ◽  
Improved Stability ◽  
Deactivation Rate Constant ◽  
Acid Catalyzed

ABSTRACTAtomic layer deposition (ALD) has been used to coat SBA-15 and functionalized SBA-15 with various metal oxides. Use of SBA-15 coated with 4-10 ALD cycles of titania, alumina, niobia, or zirconia in the acid-catalyzed dehydration of fructose to 5-hydroxymethylfurfural (HMF) resulted in 24-57% conversion, with 0-22% selectivity, at 130 °C with 2 wt % fructose in 4:1 THF:H2O. Propylsulfonic acid functionalized SBA-15 (SBA-15-PrSO3H) had a 25% conversion and 48% selectivity for HMF under the same conditions. SBA-15-PrSO3H was also coated with 2 ALD cycles of titania followed by 8 ALD cycles silica. The deactivation rate constant for SBA-15-PrSO3H was 2.7 x 10-2 h-1 for the dehydration of fructose to HMF in a flow reactor at 130 °C with a feed of 2 wt % fructose in 4:1 THF:H2O. In comparison, the deactivation rate constant for the ALD coated SBA-15-PrSO3H-ALD was 7.9 x 10-3 h-1.

Direct patterning of metal oxides by hard templates and atomic layer deposition

2013 ◽  
Vol 10 (8/9) ◽  
pp. 692 ◽  
Author(s):  
Hyunchul Kim ◽  
Changdeuck Bae ◽  
Hyun Suk Jung ◽  
Jang Sik Lee ◽  
Hyunjung Shin
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Atomic Layer ◽  
Direct Patterning ◽  
Layer Deposition

Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment

2019 ◽  
Vol 40 (1) ◽  
pp. 012806 ◽  
Author(s):  
Hui Hao ◽  
Xiao Chen ◽  
Zhengcheng Li ◽  
Yang Shen ◽  
Hu Wang ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Gallium Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Remote Plasma ◽  
Layer Deposition ◽  
Plasma Pretreatment

Roughness evolution during the atomic layer deposition of metal oxides

2013 ◽  
Vol 31 (6) ◽  
pp. 061501 ◽  
Author(s):  
Peter Antony Premkumar ◽  
Annelies Delabie ◽  
Leonard N. J. Rodriguez ◽  
Alain Moussa ◽  
Christoph Adelmann
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Atomic Layer ◽  
Layer Deposition
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