Wet chemical etching process for wafer scale isolation and interconnection of GaSb based device layers grown on GaAs substrates

Jung Min Kim; Partha S. Dutta; Eric Brown; Jose M. Borrego; Paul Greiff

doi:10.1116/1.4801008

Wet chemical etching process for wafer scale isolation and interconnection of GaSb based device layers grown on GaAs substrates

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.4801008 ◽

2013 ◽

Vol 31 (3) ◽

pp. 031204 ◽

Cited By ~ 3

Author(s):

Jung Min Kim ◽

Partha S. Dutta ◽

Eric Brown ◽

Jose M. Borrego ◽

Paul Greiff

Keyword(s):

Chemical Etching ◽

Etching Process ◽

Wafer Scale ◽

Gaas Substrates ◽

Wet Chemical ◽

Wet Chemical Etching

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Surface characterization of patterning on MgO single crystals using wet chemical etching process to advance MEMS devices

Journal of Micromechanics and Microengineering ◽

10.1088/1361-6439/ab504d ◽

2019 ◽

Vol 30 (1) ◽

pp. 015001

Author(s):

Jia Liu ◽

Pianggang Jia ◽

Xiaoyong Chen ◽

Ting Liang ◽

Hao Liu ◽

...

Keyword(s):

Single Crystals ◽

Chemical Etching ◽

Surface Characterization ◽

Etching Process ◽

Mems Devices ◽

Wet Chemical ◽

Wet Chemical Etching

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ChemInform Abstract: Improved Thinning of GaAs Substrates by Wet Chemical Etching

ChemInform ◽

10.1002/chin.199050354 ◽

1990 ◽

Vol 21 (50) ◽

Author(s):

K. BOCK ◽

A. GRUEB ◽

H. L. HARTNAGEL

Keyword(s):

Chemical Etching ◽

Gaas Substrates ◽

Wet Chemical ◽

Wet Chemical Etching

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Wet Chemical Etching Process of BST Thin Films for Pyroelectric Infrared Detectors

Ferroelectrics ◽

10.1080/00150193.2010.492740 ◽

2010 ◽

Vol 410 (1) ◽

pp. 137-144 ◽

Cited By ~ 5

Author(s):

Tianjin Zhang ◽

He Huang ◽

Ren Chen

Keyword(s):

Thin Films ◽

Infrared Detectors ◽

Chemical Etching ◽

Etching Process ◽

Bst Thin Films ◽

Wet Chemical ◽

Wet Chemical Etching

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Permittivity of LTCC substrates porousified with a wet chemical etching process

Procedia Engineering ◽

10.1016/j.proeng.2010.09.114 ◽

2010 ◽

Vol 5 ◽

pp. 327-330 ◽

Cited By ~ 3

Author(s):

Achim Bittner ◽

Ulrich Schmid

Keyword(s):

Chemical Etching ◽

Etching Process ◽

Wet Chemical ◽

Wet Chemical Etching

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Hybrid dry-wet chemical etching process for via holes for gallium arsenide MMIC manufacturing

IEEE Transactions on Semiconductor Manufacturing ◽

10.1109/66.17990 ◽

1988 ◽

Vol 1 (4) ◽

pp. 157-159 ◽

Cited By ~ 6

Author(s):

E.Y. Chang ◽

R.M. Nagarajan ◽

C.J. Kryzak ◽

K.P. Pande

Keyword(s):

Gallium Arsenide ◽

Chemical Etching ◽

Etching Process ◽

Via Holes ◽

Wet Chemical ◽

Wet Chemical Etching

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Improved Thinning of GaAs Substrates by Wet Chemical Etching

Journal of The Electrochemical Society ◽

10.1149/1.2086203 ◽

1990 ◽

Vol 137 (10) ◽

pp. 3301-3302 ◽

Cited By ~ 4

Author(s):

K. Bock ◽

A. Grüb ◽

H. L. Hartnagel

Keyword(s):

Chemical Etching ◽

Gaas Substrates ◽

Wet Chemical ◽

Wet Chemical Etching

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Three-dimensional numerical simulation for anisotropic wet chemical etching process

Molecular Simulation ◽

10.1080/08927020601067508 ◽

2007 ◽

Vol 33 (7) ◽

pp. 593-597 ◽

Cited By ~ 1

Author(s):

J.-G. Lee ◽

T. Won

Keyword(s):

Numerical Simulation ◽

Chemical Etching ◽

Three Dimensional ◽

Etching Process ◽

Wet Chemical ◽

Wet Chemical Etching

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Improving the sidewall quality of nanosecond laser-drilled deep through-silicon vias by incorporating a wet chemical etching process

Micro & Nano Letters ◽

10.1049/mnl.2012.0303 ◽

2012 ◽

Vol 7 (7) ◽

pp. 693 ◽

Cited By ~ 2

Author(s):

Chao-Wei Tang ◽

Kuan-Ming Li ◽

Hong-Tsu Young

Keyword(s):

Chemical Etching ◽

Etching Process ◽

Nanosecond Laser ◽

Through Silicon Vias ◽

Wet Chemical ◽

Wet Chemical Etching ◽

Silicon Vias

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Superconducting nanobridges prepared by a self-limiting wet chemical etching process

Superconductor Science and Technology ◽

10.1088/0953-2048/11/12/008 ◽

1998 ◽

Vol 11 (12) ◽

pp. 1397-1400 ◽

Cited By ~ 6

Author(s):

F-M Kamm ◽

A Plettl ◽

P Ziemann

Keyword(s):

Chemical Etching ◽

Etching Process ◽

Wet Chemical ◽

Wet Chemical Etching

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A 3-D Simulator for Silicon Anisotropic Wet Chemical Etching Process Based on Cellular Automata

Journal of Physics Conference Series ◽

10.1088/1742-6596/34/1/111 ◽

2006 ◽

Vol 34 ◽

pp. 674-679 ◽

Cited By ~ 6

Author(s):

Zai-Fa Zhou ◽

Qing-An Huang ◽

Wei-Hua Li ◽

Chi Zhu

Keyword(s):

Cellular Automata ◽

Chemical Etching ◽

Etching Process ◽

Wet Chemical ◽

Wet Chemical Etching

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