Carbon contamination and oxidation of Au surfaces under extreme ultraviolet radiation: An x-ray photoelectron spectroscopy study

2012 ◽  
Vol 30 (4) ◽  
pp. 041603 ◽  
Author(s):  
Al-Montaser Bellah Al-Ajlony ◽  
Aloke Kanjilal ◽  
Sivanandan S. Harilal ◽  
Ahmed Hassanein
Keyword(s):  
Ultraviolet Radiation ◽  
Photoelectron Spectroscopy ◽  
Extreme Ultraviolet ◽  
Spectroscopy Study ◽  
Carbon Contamination ◽  
X Ray ◽  
Extreme Ultraviolet Radiation

scholarly journals Towards chemically neutral carbon cleaning processes: plasma cleaning of Ni, Rh and Al reflective optical coatings and thin Al filters for free-electron lasers and synchrotron beamline applications

2018 ◽  
Vol 25 (6) ◽  
pp. 1642-1649 ◽  
Author(s):  
Harol Moreno Fernández ◽  
Marco Zangrando ◽  
Guillaume Sauthier ◽  
Alejandro R. Goñi ◽  
Vincent Carlino ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Free Electron ◽  
Inductively Coupled Plasma ◽  
High Performance ◽  
Extreme Ultraviolet ◽  
Filter Material ◽  
Gas Mixture ◽  
Carbon Contamination ◽  
X Ray ◽  
Chemical Surface

The choice of a reflective optical coating or filter material has to be adapted to the intended field of application. This is mainly determined by the required photon energy range or by the required reflection angle. Among various materials, nickel and rhodium are common materials used as reflective coatings for (soft) X-ray mirrors. Similarly, aluminium is one of the most commonly used materials for extreme ultraviolet and soft X-ray transmission filters. However, both of these types of optics are subject to carbon contamination, which can be increasingly problematic for the operation of the high-performance free-electron laser and synchrotron beamlines. As an attempt to remove this type of contamination, an inductively coupled plasma source has been used in conjunction with N2/O2/H2 and N2/H2 feedstock gas plasmas. Results from the chemical surface analysis of the above materials before and after plasma treatment using X-ray photoelectron spectroscopy are reported. It is concluded that a favorable combination of an N2/H2 plasma feedstock gas mixture leads to the best chemical surface preservation of Ni, Rh and Al while removing the carbon contamination. However, this feedstock gas mixture does not remove C contamination as rapidly as, for example, an N2/O2/H2 plasma which induces the surface formation of NiO and NiOOH in Ni and RhOOH in Rh foils. As an applied case, the successful carbon removal from ultrathin Al filters previously used at the FERMI FEL1 using an N2/H2 plasma is demonstrated.

scholarly journals Multilayer Reflective Coatings for BEUV Lithography: A Review

Nanomaterials ◽  
2021 ◽  
Vol 11 (11) ◽  
pp. 2782
Author(s):  
Paul C. Uzoma ◽  
Salman Shabbir ◽  
Huan Hu ◽  
Paul C. Okonkwo ◽  
Oleksiy V. Penkov
Keyword(s):  
Ultraviolet Radiation ◽  
Multilayer Film ◽  
Extreme Ultraviolet ◽  
Crucial Point ◽  
Optical Wave ◽  
X Ray ◽  
Development Status ◽  
Design Concepts ◽  
Extreme Ultraviolet Radiation ◽  
Reflective Coatings

The development of microelectronics is always driven by reducing transistor size and increasing integration, from the initial micron-scale to the current few nanometers. The photolithography technique for manufacturing the transistor needs to reduce the wavelength of the optical wave, from ultraviolet to the extreme ultraviolet radiation. One approach toward decreasing the working wavelength is using lithography based on beyond extreme ultraviolet radiation (BEUV) with a wavelength around 7 nm. The BEUV lithography relies on advanced reflective optics such as periodic multilayer film X-ray mirrors (PMMs). PMMs are artificial Bragg crystals having alternate layers of “light” and “heavy” materials. The periodicity of such a structure is relatively half of the working wavelength. Because a BEUV lithographical system contains at least 10 mirrors, the optics’ reflectivity becomes a crucial point. The increasing of a single mirror’s reflectivity by 10% will increase the system’s overall throughput six-fold. In this work, the properties and development status of PMMs, particularly for BEUV lithography, were reviewed to gain a better understanding of their advantages and limitations. Emphasis was given to materials, design concepts, structure, deposition method, and optical characteristics of these coatings.

Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection

2018 ◽  
Vol 189 (03) ◽  
pp. 323-334 ◽  
Author(s):  
D.B. Abramenko ◽  
P.S. Antsiferov ◽  
D.I. Astakhov ◽  
Aleksandr Yu. Vinokhodov ◽  
Il'ya Yu. Vichev ◽  
...  
Keyword(s):  
Ultraviolet Radiation ◽  
Extreme Ultraviolet ◽  
Mask Inspection ◽  
Extreme Ultraviolet Radiation
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