In-situ real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl)ruthenium] and molecular oxygen

Martin Knaut; Marcel Junige; Matthias Albert; Johann W. Bartha

doi:10.1116/1.3670405

In-situ real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl)ruthenium] and molecular oxygen

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.3670405 ◽

2012 ◽

Vol 30 (1) ◽

pp. 01A151 ◽

Cited By ~ 22

Author(s):

Martin Knaut ◽

Marcel Junige ◽

Matthias Albert ◽

Johann W. Bartha

Keyword(s):

Atomic Layer Deposition ◽

Real Time ◽

Molecular Oxygen ◽

Process Development ◽

Atomic Layer ◽

Layer Deposition

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Real-time in situ ellipsometric monitoring of aluminum nitride film growth via hollow-cathode plasma-assisted atomic layer deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.5085341 ◽

2019 ◽

Vol 37 (2) ◽

pp. 020927 ◽

Cited By ~ 5

Author(s):

Adnan Mohammad ◽

Deepa Shukla ◽

Saidjafarzoda Ilhom ◽

Brian Willis ◽

Blaine Johs ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Aluminum Nitride ◽

Real Time ◽

Hollow Cathode ◽

Film Growth ◽

Atomic Layer ◽

Nitride Film ◽

Cathode Plasma ◽

Layer Deposition

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Real Time In-Situ Probing of Atomic Layer Deposition Processes using Infrared and Near Infrared Spectroscopy

ECS Meeting Abstracts ◽

10.1149/ma2008-02/24/1911 ◽

2008 ◽

Keyword(s):

Infrared Spectroscopy ◽

Atomic Layer Deposition ◽

Real Time ◽

Near Infrared Spectroscopy ◽

Near Infrared ◽

Atomic Layer ◽

Layer Deposition ◽

Deposition Processes

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Monitoring atomic layer deposition processes in situ and in real-time by spectroscopic ellipsometry

2011 Semiconductor Conference Dresden ◽

10.1109/scd.2011.6068739 ◽

2011 ◽

Cited By ~ 4

Author(s):

Marcel Junige ◽

Marion Geidel ◽

Martin Knaut ◽

Matthias Albert ◽

Johann W. Bartha

Keyword(s):

Atomic Layer Deposition ◽

Real Time ◽

Spectroscopic Ellipsometry ◽

Atomic Layer ◽

Layer Deposition ◽

Deposition Processes

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In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.5122797 ◽

2020 ◽

Vol 38 (1) ◽

pp. 014014

Author(s):

Franziska Naumann ◽

Johanna Reck ◽

Hassan Gargouri ◽

Bernd Gruska ◽

Adrian Blümich ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Real Time ◽

Spectroscopic Analysis ◽

Atomic Layer ◽

Ex Situ ◽

Layer Deposition ◽

Al2o3 Films

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Real-time in situ process monitoring and characterization of GaN films grown on Si (100) by low-temperature hollow-cathode plasma-atomic layer deposition using trimethylgallium and N2/H2 plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/6.0000706 ◽

2021 ◽

Vol 39 (2) ◽

pp. 022406

Author(s):

Deepa Shukla ◽

Adnan Mohammad ◽

Saidjafarzoda Ilhom ◽

Brian G. Willis ◽

Ali Kemal Okyay ◽

...

Keyword(s):

Low Temperature ◽

Atomic Layer Deposition ◽

Real Time ◽

Process Monitoring ◽

Hollow Cathode ◽

Atomic Layer ◽

Cathode Plasma ◽

Layer Deposition

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SiO2 Atomic Layer Deposition Using Tris(dimethylamino)silane and Hydrogen Peroxide Studied by in Situ Transmission FTIR Spectroscopy

The Journal of Physical Chemistry C ◽

10.1021/jp806638e ◽

2009 ◽

Vol 113 (19) ◽

pp. 8249-8257 ◽

Cited By ~ 102

Author(s):

B. B. Burton ◽

S. W. Kang ◽

S. W. Rhee ◽

S. M. George

Keyword(s):

Hydrogen Peroxide ◽

Atomic Layer Deposition ◽

Ftir Spectroscopy ◽

Atomic Layer ◽

Layer Deposition

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Realization of high-quality HfO2 on In0.53Ga0.47As by in-situ atomic-layer-deposition

Applied Physics Letters ◽

10.1063/1.4706261 ◽

2012 ◽

Vol 100 (17) ◽

pp. 172110 ◽

Cited By ~ 38

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

High Quality ◽

Layer Deposition

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Atomic Layer Deposition and in-Situ Characterization of Yttrium Oxide and Yttria-Stabilized Zirconia

ECS Transactions ◽

10.1149/06907.0109ecst ◽

2015 ◽

Vol 69 (7) ◽

pp. 109-116

Author(s):

L. Lecordier

Keyword(s):

Atomic Layer Deposition ◽

Yttrium Oxide ◽

Atomic Layer ◽

Yttria Stabilized Zirconia ◽

Stabilized Zirconia ◽

In Situ Characterization ◽

Layer Deposition

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In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition

Advanced Materials Interfaces ◽

10.1002/admi.201800957 ◽

2018 ◽

Vol 5 (24) ◽

pp. 1800957 ◽

Cited By ~ 1

Author(s):

Pouyan Motamedi ◽

Ken Bosnick ◽

Ken Cadien ◽

James D. Hogan

Keyword(s):

Thin Films ◽

Phase Transformation ◽

Atomic Layer Deposition ◽

Diffraction Analysis ◽

Atomic Layer ◽

X Ray Diffraction ◽

X Ray ◽

Nickel Thin Films ◽

Layer Deposition

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Development of a scanning probe microscopy integrated atomic layer deposition system for in situ successive monitoring of thin film growth

Review of Scientific Instruments ◽

10.1063/1.5042463 ◽

2018 ◽

Vol 89 (12) ◽

pp. 123702 ◽

Cited By ~ 1

Author(s):

Kun Cao ◽

Quan Hu ◽

Jiaming Cai ◽

Miao Gong ◽

Jianfeng Yang ◽

...

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Scanning Probe Microscopy ◽

Film Growth ◽

Atomic Layer ◽

Thin Film Growth ◽

Scanning Probe ◽

Probe Microscopy ◽

Layer Deposition

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