scholarly journals In situ study of the role of substrate temperature during atomic layer deposition of HfO2 on InP

2013 ◽  
Vol 114 (15) ◽  
pp. 154105 ◽  
Author(s):  
H. Dong ◽  
Santosh, K.C. ◽  
X. Qin ◽  
B. Brennan ◽  
S. McDonnell ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Substrate Temperature ◽  
Atomic Layer ◽  
In Situ Study ◽  
Layer Deposition

In situ study of the atomic layer deposition of HfO2 on Si

2012 ◽  
Vol 30 (1) ◽  
pp. 01A143 ◽  
Author(s):  
Krzysztof Kolanek ◽  
Massimo Tallarida ◽  
Marcel Michling ◽  
Dieter Schmeisser
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
In Situ Study ◽  
Layer Deposition

In Situ Photoluminescence of Colloidal Quantum Dots During Gas Exposure—The Role of Water and Reactive Atomic Layer Deposition Precursors

2019 ◽  
Vol 11 (29) ◽  
pp. 26277-26287 ◽  
Author(s):  
Jakob Kuhs ◽  
Andreas Werbrouck ◽  
Natalia Zawacka ◽  
Emile Drijvers ◽  
Philippe F. Smet ◽  
...  
Keyword(s):  
Quantum Dots ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Colloidal Quantum Dots ◽  
Layer Deposition ◽  
Gas Exposure

scholarly journals In situ study of the thermal stability of supported Pt nanoparticles and their stabilization via atomic layer deposition overcoating

Nanoscale ◽  
2020 ◽  
Vol 12 (21) ◽  
pp. 11684-11693
Author(s):  
Eduardo Solano ◽  
Jolien Dendooven ◽  
Ji-Yu Feng ◽  
Philipp Brüner ◽  
Matthias M. Minjauw ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Atomic Layer Deposition ◽  
Pt Nanoparticles ◽  
Atomic Layer ◽  
Pt Nanoparticle ◽  
In Situ Study ◽  
Layer Deposition ◽  
Nanoparticle Stabilization ◽  
Thermal Stability Of

Supported Pt nanoparticle stabilization via Atomic Layer Deposition overcoating with Al2O3 has been proved to prevent particle coarsening during thermal annealing for widely spaced nanoparticles while ensuring surface accessibility for applications.

In situ study of HfO2 atomic layer deposition on InP(100)

2013 ◽  
Vol 102 (17) ◽  
pp. 171602 ◽  
Author(s):  
H. Dong ◽  
B. Brennan ◽  
D. Zhernokletov ◽  
J. Kim ◽  
C. L. Hinkle ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
In Situ Study ◽  
Layer Deposition

Atomic layer deposition of ternary ruthenates by combining metalorganic precursors with RuO4 as the co-reactant

2021 ◽  
Author(s):  
Matthias Marcus Minjauw ◽  
Ji-Yu Feng ◽  
Timo Sajavaara ◽  
Christophe Detavernier ◽  
Jolien Dendooven
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Ruthenium Tetroxide ◽  
Layer Deposition

In this work, the use of ruthenium tetroxide (RuO4) as a co-reactant for atomic layer deposition (ALD) is reported. The role of RuO4 as a co-reactant is twofold: it acts...

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