Low temperature growth of high-k Hf–La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties

2012 ◽  
Vol 30 (1) ◽  
pp. 01A147 ◽  
Author(s):  
Fu Tang ◽  
Chiyu Zhu ◽  
David J. Smith ◽  
Robert J. Nemanich
2007 ◽  
Vol 112 (2) ◽  
pp. 401-406 ◽  
Author(s):  
I.A. Kowalik ◽  
E. Guziewicz ◽  
K. Kopalko ◽  
S. Yatsunenko ◽  
M. Godlewski ◽  
...  

2013 ◽  
Vol 62 (11) ◽  
pp. 117302
Author(s):  
Feng Jia-Heng ◽  
Tang Li-Dan ◽  
Liu Bang-Wu ◽  
Xia Yang ◽  
Wang Bing

2008 ◽  
Vol 53 (9(5)) ◽  
pp. 2880-2883 ◽  
Author(s):  
E. Guziewicz ◽  
M. Godlewski ◽  
K. Kopalko ◽  
I. A. Kowalik ◽  
S. Yatsunenko ◽  
...  

2011 ◽  
Vol 23 (20) ◽  
pp. 4417-4419 ◽  
Author(s):  
Thomas J. Knisley ◽  
Thiloka C. Ariyasena ◽  
Timo Sajavaara ◽  
Mark J. Saly ◽  
Charles H. Winter

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