Low temperature growth of high-k Hf–La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
2012 ◽
Vol 30
(1)
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pp. 01A147
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2018 ◽
Vol 459
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pp. 830-834
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2007 ◽
Vol 112
(2)
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pp. 401-406
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2008 ◽
Vol 53
(9(5))
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2016 ◽
Vol 34
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pp. 041511
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