Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems

2011 ◽  
Vol 29 (6) ◽  
pp. 06FH04 ◽  
Author(s):  
David O. S. Melville ◽  
Alan E. Rosenbluth ◽  
Andreas Waechter ◽  
Marc Millstone ◽  
Jaione Tirapu-Azpiroz ◽  
...  
Keyword(s):  
Projection Lithography ◽  
Resolution Limits ◽  
193 Nm

Excimer Projection Lithography at 193-nm Wavelength

1988 ◽  
Author(s):  
M. Rothschild ◽  
D. J. Ehrlich
Keyword(s):  
Projection Lithography ◽  
193 Nm

Excimer Projection Lithography At 193-nm Wavelength

1988 ◽  
Author(s):  
M. Rothschild ◽  
D. J. Ehrlich ◽  
Burn J. Lin
Keyword(s):  
Projection Lithography ◽  
193 Nm

Simulation and Experimental Research of 193 nm Projection Lithography Lens Supporting

2012 ◽  
Vol 39 (8) ◽  
pp. 0816002
Author(s):  
田伟 Tian Wei ◽  
王平 Wang Ping ◽  
王汝冬 Wang Rudong ◽  
王立朋 Wang Lipeng ◽  
隋永新 Sui Yongxin
Keyword(s):  
Experimental Research ◽  
Projection Lithography ◽  
193 Nm

A Study of Clustering for the Enhancement of Image Resolution in Dynamic Photon Emission

2019 ◽  
Author(s):  
S. Chef ◽  
C. T. Chua ◽  
C. L. Gan
Keyword(s):  
Signal To Noise Ratio ◽  
Photon Emission ◽  
Optical Signal ◽  
Image Resolution ◽  
Time Dimension ◽  
Processing Scheme ◽  
3D Space ◽  
Initial Acquisition ◽  
Resolution Limits ◽  
Emission Microscopy

Abstract Limited spatial resolution and low signal to noise ratio are some of the main challenges in optical signal observation, especially for photon emission microscopy. As dynamic emission signals are generated in a 3D space, the use of the time dimension in addition to space enables a better localization of switching events. It can actually be used to infer information with a precision above the resolution limits of the acquired signals. Taking advantage of this property, we report on a post-acquisition processing scheme to generate emission images with a better image resolution than the initial acquisition.

Amplification of fibre Bragg grating reflectivity by post-writing exposure with a 193 nm ArF laser

1994 ◽  
Vol 30 (14) ◽  
pp. 1133-1134 ◽  
Author(s):  
P. E. Dyer ◽  
K. C. Byron ◽  
R. J. Farley ◽  
R. Giedl
Keyword(s):  
Bragg Grating ◽  
Fibre Bragg Grating ◽  
Arf Laser ◽  
193 Nm

Inorganic Si-O-C Antireflection Coating at 193 nm for Cu Dual Damascene Process

2003 ◽  
Vol 150 (1) ◽  
pp. G58 ◽  
Author(s):  
Sang-Yun Lee ◽  
Yong-Bae Kim ◽  
Jeong Soo Byun
Keyword(s):  
Antireflection Coating ◽  
Dual Damascene ◽  
Damascene Process ◽  
193 Nm

Contextual DNA features significant for the DNA damage by the 193-nm ultraviolet laser beam

2012 ◽  
Vol 447 (1) ◽  
pp. 267-272 ◽  
Author(s):  
N. N. Vtyurina ◽  
S. L. Grohovsky ◽  
A. B. Vasiliev ◽  
I. I. Titov ◽  
P. M. Ponomarenko ◽  
...  
Keyword(s):  
Dna Damage ◽  
Laser Beam ◽  
Ultraviolet Laser ◽  
193 Nm

C–Br bond rupture in 193 nm photodissociation of vinyl bromide

1998 ◽  
Vol 231 (2-3) ◽  
pp. 345-353 ◽  
Author(s):  
Hideki Katayanagi ◽  
Nobuaki Yonekuira ◽  
Toshinori Suzuki
Keyword(s):  
Bond Rupture ◽  
Vinyl Bromide ◽  
193 Nm
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