Different growth mechanisms of vertical carbon nanotubes by rf- or dc-plasma enhanced chemical vapor deposition at low temperature

2010 ◽  
Vol 28 (6) ◽  
pp. 1081-1085 ◽  
Author(s):  
Huiyao Wang ◽  
John J. Moore
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Growth Mechanisms ◽  
Dc Plasma

Chemical vapor deposition of nickel-group metals on multiwall carbon nanotubes

2007 ◽  
Vol 85 (10) ◽  
pp. 645-650 ◽  
Author(s):  
Maoqi Feng ◽  
Richard J Puddephatt
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Carbon Nanotube ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Multiwall Carbon Nanotubes ◽  
Chemical Vapor ◽  
Pt Films ◽  
Bimetallic Films ◽  
Multiwall Carbon

Chemical vapor deposition (CVD) of Ni, Pd, and Pt films and of Ni/Pd and Pd/Pt bimetallic films on multiwall carbon nanotubes (MWCNTs) can be effected at low temperature if the nanotubes are pretreated by CVD of titanium carbide. In the absence of the pretreatment, the CVD leads to formation of isolated nanoparticles of the nickel-group metals. The metallized MWCNTs are curved or kinked, as a result of the interaction with the metal. Preliminary oxidation of the carbon nanotubes allows easier metallization, and the bending of the metallated nanotubes is not observed in this case.Key words: Chemical vapor deposition, platinum, palladium, nickel, carbon, nanotube.

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