Residual layer uniformity using complementary patterns to compensate for pattern density variation in UV nanoimprint lithography

2010 ◽  
Vol 28 (6) ◽  
pp. C6M125-C6M129 ◽  
Author(s):  
Qing Wang ◽  
Hiroshi Hiroshima ◽  
Hidemasa Atobe ◽  
Sung-Won Youn
Keyword(s):  
Nanoimprint Lithography ◽  
Density Variation ◽  
Residual Layer ◽  
Pattern Density

Challenges of residual layer minimisation in thermal nanoimprint lithography

2007 ◽  
Author(s):  
Nicolas Bogdanski ◽  
Matthias Wissen ◽  
Saskia Möllenbeck ◽  
Hella-Christin Scheer
Keyword(s):  
Nanoimprint Lithography ◽  
Residual Layer

scholarly journals Density variation of nanoscale patterns in thermal nanoimprint lithography

2007 ◽  
Vol 91 (25) ◽  
pp. 253111 ◽  
Author(s):  
Young Seok Woo ◽  
Jae Kwan Kim ◽  
Dong Eon Lee ◽  
Kahp Yang Suh ◽  
Woo Il Lee
Keyword(s):  
Nanoimprint Lithography ◽  
Density Variation ◽  
Nanoscale Patterns

The influence of stamp deformation on residual layer homogeneity in thermal nanoimprint lithography

2008 ◽  
Vol 85 (9) ◽  
pp. 1892-1896 ◽  
Author(s):  
S. Merino ◽  
A. Retolaza ◽  
A. Juarros ◽  
H. Schift
Keyword(s):  
Nanoimprint Lithography ◽  
Residual Layer

Stamp deformation and its influence on residual layer homogeneity in thermal nanoimprint lithography

2008 ◽  
Vol 85 (5-6) ◽  
pp. 877-880 ◽  
Author(s):  
S. Merino ◽  
A. Retolaza ◽  
H. Schift ◽  
V. Trabadelo
Keyword(s):  
Nanoimprint Lithography ◽  
Residual Layer

Residual layer-free Reverse Nanoimprint Lithography on silicon and metal-coated substrates

2015 ◽  
Vol 141 ◽  
pp. 56-61 ◽  
Author(s):  
Ariadna Fernández ◽  
Juan Medina ◽  
Christian Benkel ◽  
Markus Guttmann ◽  
Brian Bilenberg ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Residual Layer

The Effect of Substrate Deformation in UV-Nanoimprint Lithography Using a Large Area Stamp

2007 ◽  
Vol 121-123 ◽  
pp. 649-652
Author(s):  
Ki Don Kim ◽  
Young Suk Sim ◽  
Jun Ho Jeong ◽  
Hyun Kee Sohn ◽  
Eung Sug Lee ◽  
...  
Keyword(s):  
Finite Element Method ◽  
Finite Element ◽  
Layer Thickness ◽  
Nanoimprint Lithography ◽  
Residual Layer ◽  
Simplified Model ◽  
Large Area ◽  
Severe Deformation ◽  
Element Method

We investigated the non-uniformity of the residual layer thickness caused by wafer deformation in an experiment that examined different wafer thicknesses using UV-NIL with an element-wise patterned stamp (EPS). Experiments using the EPS were performed on an EVG®620-NIL. Severe deformation of the wafer served as an obstacle to the spread of resin drops, which caused non-uniformity of the residual layer thickness. We also simulated the imprint process using a simplified model and finite element method to analyze the non-uniformity.

scholarly journals Guiding Chart for Initial Layer Choice with Nanoimprint Lithography

Nanomaterials ◽  
2021 ◽  
Vol 11 (3) ◽  
pp. 710
Author(s):  
Andre Mayer ◽  
Hella-Christin Scheer
Keyword(s):  
Nanoimprint Lithography ◽  
Room Temperature ◽  
Periodic Structures ◽  
Residual Layer ◽  
Graphical Form ◽  
Initial Layer ◽  
Lithography Process ◽  
Cavity Filling ◽  
Theoretical Results ◽  
Relevant Factors

When nanoimprint serves as a lithography process, it is most attractive for the ability to overcome the typical residual layer remaining without the need for etching. Then, ‘partial cavity filling’ is an efficient strategy to provide a negligible residual layer. However, this strategy requires an adequate choice of the initial layer thickness to work without defects. To promote the application of this strategy we provide a ‘guiding chart’ for initial layer choice. Due to volume conservation of the imprint polymer this guiding chart has to consider the geometric parameters of the stamp, where the polymer fills the cavities only up to a certain height, building a meniscus at its top. Furthermore, defects that may develop during the imprint due to some instability of the polymer within the cavity have to be avoided; with nanoimprint, the main instabilities are caused by van der Waals forces, temperature gradients, and electrostatic fields. Moreover, practical aspects such as a minimum polymer height required for a subsequent etching of the substrate come into play. With periodic stamp structures the guiding chart provided will indicate a window for defect-free processing considering all these limitations. As some of the relevant factors are system-specific, the user has to construct his own guiding chart in praxis, tailor-made to his particular imprint situation. To facilitate this task, all theoretical results required are presented in a graphical form, so that the quantities required can simply be read from these graphs. By means of examples, the implications of the guiding chart with respect to the choice of the initial layer are discussed with typical imprint scenarios, nanoimprint at room temperature, at elevated temperature, and under electrostatic forces. With periodic structures, the guiding chart represents a powerful and straightforward tool to avoid defects in praxis, without in-depth knowledge of the underlying physics.

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