Plasma doping two-dimensional characterization using low energy x-ray emission spectroscopy and full wafer secondary ion mass spectrometry/angle-resolved x-ray electron spectroscopy techniques
2010 ◽
Vol 28
(1)
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pp. C1D1-C1D4
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1996 ◽
Vol 14
(1)
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pp. 348
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Keyword(s):
2010 ◽
Vol 28
(1)
◽
pp. C1C54-C1C58
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2005 ◽
Vol 237
(1-2)
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pp. 336-340
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1996 ◽
Vol 11
(1)
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pp. 229-235
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1975 ◽
Vol 12
(1)
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pp. 352-353
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