Direct write of optical waveguides on chalcogenide thin films using electron beams

2009 ◽  
Vol 27 (6) ◽  
pp. 2737 ◽  
Author(s):  
G. B. Hoffman ◽  
W. Zhou ◽  
R. Sooryakumar ◽  
R. M. Reano
Keyword(s):  
Thin Films ◽  
Optical Waveguides ◽  
Electron Beams ◽  
Direct Write ◽  
Chalcogenide Thin Films

Single-Step Microstructure Patterning in Titania-Doped Sol-Gel Glassy Thin Films with Electron Beams

2004 ◽  
Vol 847 ◽  
Author(s):  
Xinshi Luo ◽  
Congji Zha ◽  
Barry Luther-Davies
Keyword(s):  
Thin Films ◽  
Optical Waveguides ◽  
Electron Beams ◽  
Uv Light ◽  
Sol Gel ◽  
Fused Silica ◽  
Single Step ◽  
Direct Writing ◽  
Silica Network ◽  
Good Thermal Stability

ABSTRACTTo achieve a simplified microstructure patterning process, patterning in thin films with a singlestep exposure to UV-light or E-beam process for fabrication of integrated optical waveguides and components is of great interest in optics, because the complicated structure developing stage by wet chemical or plasma etching is not required. In this paper, we describe our study on the microstructure patterning in TiO2-doped hybrid glassy polymer thin films by irradiating with focused E-beam. An anhydrous sol-gel process based on hydrolysis and condensation of metal alkoxides with boric acid under non-hydrous conditions was applied to homogeneously incorporating TiO2into silica network, and transparent glassy TiO2-doped thin films with varied TiO2concentrations (up to 40 mol%) were prepared by spin coating the hybrid polymer onto fused silica substrates and silicon wafers. The TiO2-doped hybrid material showed a low OH absorption, low optical losses at the telecommunication windows (<0.40 dB/cm at 1550 nm and <0.20 dB/cm at 1310 nm respectively), good thermo-optical linearity and good thermal stability up to 200 °C. Single-step direct surface patterning in the TiO2-doped hybrid glassy films with focused electron beams irradiation showed that fine structure with resolution at submicron level can be fabricated. As the process does not need a developing (etching) process, the profiles of the lines fabricated by the E-beam direct writing showed few distortion. The high precise patterning microstructure with submicron feature sizes in the TiO2-doped hybrid glassy thin films may provide potentials for applications to the fabrication of optical gratings.

Relief and trench formation on chalcogenide thin films using electron beams

2008 ◽  
Vol 26 (6) ◽  
pp. 2478-2483 ◽  
Author(s):  
G. B. Hoffman ◽  
W.-C. Liu ◽  
W. Zhou ◽  
R. Sooryakumar ◽  
P. Boolchand ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Beams ◽  
Chalcogenide Thin Films

The effect of complexing agents in chemical solution deposition of metal chalcogenide thin films

2021 ◽  
Author(s):  
Sucheta Sengupta ◽  
Rinki Aggarwal ◽  
Yuval Golan
Keyword(s):  
Thin Films ◽  
Chemical Solution Deposition ◽  
Metal Ion ◽  
Chemical Deposition ◽  
Review Article ◽  
Complexing Agents ◽  
Chemical Solution ◽  
Solution Deposition ◽  
Metal Chalcogenide ◽  
Chalcogenide Thin Films

This review article gives an overview of different complexing agents used during chemical deposition of metal chalcogenide thin films and their role in controlling the resultant morphology by effective complexation of the metal ion.

Vibrational and conductive microscopic investigation of thermal dewetting in Ag-As-S chalcogenide thin films

2021 ◽  
pp. 149621
Author(s):  
Correr Wagner ◽  
Messaddeq Sandra Helena ◽  
Douaud Alexandre ◽  
Messaddeq Younes
Keyword(s):  
Thin Films ◽  
Microscopic Investigation ◽  
Chalcogenide Thin Films

scholarly journals Lateral electrical transport and field-effect characteristics of sputtered p-type chalcogenide thin films

2021 ◽  
Vol 119 (23) ◽  
pp. 232106
Author(s):  
Sumaiya Wahid ◽  
Alwin Daus ◽  
Asir Intisar Khan ◽  
Victoria Chen ◽  
Kathryn M. Neilson ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Transport ◽  
Field Effect ◽  
Chalcogenide Thin Films ◽  
P Type
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