Preparation of TiO2 thin films on the inner surface of a quartz tube using atmospheric-pressure microplasma

2008 ◽  
Vol 26 (3) ◽  
pp. 338-343 ◽  
Author(s):  
Hiroyuki Yoshiki ◽  
Taku Saito
Keyword(s):  
Thin Films ◽  
Atmospheric Pressure ◽  
Quartz Tube ◽  
Tio2 Thin Films ◽  
Inner Surface

scholarly journals Low Temperature Deposition of TiO2 Thin Films through Atmospheric Pressure Plasma Jet Processing

Catalysts ◽  
2021 ◽  
Vol 11 (1) ◽  
pp. 91
Author(s):  
Suresh Gosavi ◽  
Rena Tabei ◽  
Nitish Roy ◽  
Sanjay S. Latthe ◽  
Y. M. Hunge ◽  
...  
Keyword(s):  
Thin Films ◽  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Plasma Jet ◽  
Morphological Properties ◽  
Photocatalytic Decomposition ◽  
Atmospheric Pressure Plasma Jet ◽  
Tio2 Thin Films ◽  
X Ray ◽  
Pressure Plasma

Titanium dioxide (TiO2) has been widely used as a catalyst material in different applications such as photocatalysis, solar cells, supercapacitor, and hydrogen production, due to its better chemical stability, high redox potential, wide band gap, and eco-friendly nature. In this work TiO2 thin films have been deposited onto both glass and silicon substrates by the atmospheric pressure plasma jet (APPJ) technique. The structure and morphological properties of TiO2 thin films are studied using different characterization techniques like X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), Raman spectroscopy, and field emission scanning electron microscopy. XRD study reveals the bronze-phase of TiO2. The XPS study shows the presence of Ti, O, C, and N elements. The FE-SEM study shows the substrate surface is well covered with a nearly round shaped grain of different size. The optical study shows that all the deposited TiO2 thin films exhibit strong absorption in the ultraviolet region. The oleic acid photocatalytic decomposition study demonstrates that the water contact angle decreased from 80.22 to 27.20° under ultraviolet illumination using a TiO2 photocatalyst.

scholarly journals Interstitial boron-doped anatase TiO2 thin-films on optical fibres: atmospheric pressure-plasma enhanced chemical vapour deposition as the key for functional oxide coatings on temperature-sensitive substrates

2017 ◽  
Vol 5 (22) ◽  
pp. 10836-10842 ◽  
Author(s):  
Miguel Quesada-González ◽  
Kamal Baba ◽  
Carlos Sotelo-Vázquez ◽  
Patrick Choquet ◽  
Claire J. Carmalt ◽  
...  
Keyword(s):  
Thin Films ◽  
Atmospheric Pressure ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Atmospheric Pressure Plasma ◽  
Temperature Sensitive ◽  
Optical Fibres ◽  
Oxide Coatings ◽  
Tio2 Thin Films ◽  
Boron Doped

Synthesis of boron-doped anatase TiO2 thin films on temperature-sensitive polymeric optical fibres by AP-PECVD.

scholarly journals The Effects of Thermal and Atmospheric Pressure Radio Frequency Plasma Annealing in the Crystallization of TiO2 Thin Films

Coatings ◽  
2019 ◽  
Vol 9 (6) ◽  
pp. 357 ◽  
Author(s):  
Yu Xu ◽  
Yu Zhang ◽  
Tao He ◽  
Ke Ding ◽  
Xiaojiang Huang ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Treatment ◽  
Radio Frequency ◽  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Emission Spectra ◽  
Tio2 Thin Films ◽  
Pressure Plasma ◽  
Amorphous Tio2 ◽  
Plasma Annealing

Amorphous TiO2 thin films were respectively annealed by 13.56 MHz radio frequency (RF) atmospheric pressure plasma at discharge powers of 40, 60, 80 W and thermal treatment at its corresponding substrate temperature (Ts). Ts was estimated through three measurement methods (thermocouple, Newton’s law of cooling and OH optical emission spectra simulation) and showed identically close results of 196, 264 and 322 °C, respectively. Comparing with thermal annealing, this RF atmospheric pressure plasma annealing process has obvious effects in improving crystallization of the amorphous films, based on the XRD and Raman analysis of the film. Amorphous TiO2 film can be changed to anatase film at about 264 °C of Ts for 30 min plasma treatment, while it almost remains amorphous after 322 °C thermal treatment for the same time.

Photocatalytic degradation of methylene blue from aqueous solutions using nanopillars-TiO2 thin films: Batch reactor studies

2018 ◽  
Vol 18 (3) ◽  
pp. 81-91 ◽  
Author(s):  
C. Lalhriatpuia
Keyword(s):  
Thin Films ◽  
Methylene Blue ◽  
Photocatalytic Activity ◽  
Organic Carbon ◽  
Photocatalytic Degradation ◽  
Batch Reactor ◽  
Tio2 Thin Films ◽  
Initial Concentration ◽  
Bet Specific Surface Area ◽  
Interfering Ions

Nanopillars-TiO2 thin films was obtained on a borosilicate glass substrate with (S1) and without (S2) polyethylene glycol as template. The photocatalytic behaviour of S1 and S2 thin films was assessed inthe degradation of methylene blue (MB) dye from aqueous solution under batch reactor operations. The thin films were characterized by the SEM, XRD, FTIR and AFM analytical methods. BET specific surface area and pore sizes were also obtained. The XRD data confirmed that the TiO2 particles are in its anatase mineral phase. The SEM and AFM images indicated the catalyst is composed with nanosized pillars of TiO2, evenly distributed on the surface of the substrate. The BET specific surface area and pore sizes of S1 and S2 catalyst were found to be 5.217 and 1.420 m2/g and 7.77 and 4.16 nm respectively. The photocatalytic degradation of MB was well studied at wide range of physico-chemical parameters. The effect of solution pH (pH 4.0 to 10.0) and MB initial concentration (1.0 to 10.0 mg/L) was extensively studied and the effect of several interfering ions, i.e., cadmium nitrate, copper sulfate, zinc chloride, sodium chloride, sodium nitrate, sodium nitrite, glycine, oxalic acid and EDTA in the photocatalytic degradation of MB was demonstrated. The maximum percent removal of MB was observed at pH 8.0 beyond which it started decreasing and a low initial concentration of the pollutant highly favoured the photocatalytic degradation using thin films and the presence of several interfering ions diminished the photocatalytic activity of thin films to some extent. The overall photocatalytic activity was in the order: S2 > S1 > UV. The photocatalytic degradation of MB was followed the pseudo-first-order rate kinetics. The mineralization of MB was studied with total organic carbon measurement using the TOC (total organic carbon) analysis.

THIN FILMS OF SILICON COMPOUNDS DEPOSITED BY PE-CVD AT ATMOSPHERIC PRESSURE

2002 ◽  
Vol 6 (1) ◽  
pp. 12 ◽  
Author(s):  
Krzysztof Schmidt-Szalowski ◽  
Z. Rzanek-Boroch ◽  
J. Sentek ◽  
Z. Rymuza ◽  
Z. Kusznierewicz ◽  
...  
Keyword(s):  
Thin Films ◽  
Atmospheric Pressure ◽  
Silicon Compounds

STRUCTURAL, OPTICAL PROPERTIES AND PHOTOCATALYTIC ACTIVITY OF NANOCRYSTALLINE TiO2 THIN FILMS DEPOSITED BY SOL-GEL SPIN COATING

2019 ◽  
Vol 7 (1) ◽  
pp. 28
Author(s):  
KOMARAIAH DURGAM ◽  
RADHA EPPA ◽  
REDDY M. V. RAMANA ◽  
KUMAR J. SIVA ◽  
R. SAYANNA ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Photocatalytic Activity ◽  
Spin Coating ◽  
Sol Gel ◽  
Tio2 Thin Films ◽  
Nanocrystalline Tio2
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